SCHEMBL7639747

SCHEMBL7639747

CC(C)(C)Oc1cc(F)c(C(F)=C(F)F)c(F)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3692232 0.81
SCHEMBL7122255 0.77
SCHEMBL3754455 0.77 CPS1 (0.36)
SCHEMBL27817117 0.74 KIF11 (0.32)
SCHEMBL3696147 0.73
SCHEMBL7639560 0.71 KIF11 (0.31)
SCHEMBL30723906 0.71 KDM1A (0.32)
SCHEMBL3818720 0.68 ALDH1A1 (0.39)
SCHEMBL7635442 0.68
SCHEMBL12180436 0.68 KIF11 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6461791-B1 NOVEL POLYMER HAVING HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADIATION OF UP TO 300 NANOMETERS; RESIST MATERIALS HAVE SUFFICIENT TRANSPARENCY IN REGION OF EXCIMER LASER AND SATISFY RESOLUTION AND SENSITIVITY REQUIREMENTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed
US-6333436-B1 Styrene derivatives SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-12-25 US disclosed