Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17166005 | 1.00 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL12977713 | 0.88 | — | — | |
| SCHEMBL22399763 | 0.88 | — | — | |
| SCHEMBL76320 | 0.81 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL1216386 | 0.80 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL1218587 | 0.80 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL14617250 | 0.79 | — | — | |
| SCHEMBL12204602 | 0.79 | HMGCR (0.32) | — | |
| SCHEMBL1219030 | 0.77 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL21432112 | 0.77 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10719014-B2 | Photoresists comprising amide component | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-21 | — | — | US | disclosed |
| US-10564542-B2 | Photoresist compositions and methods | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2020-02-18 | — | — | US | disclosed |
| US-20190204743-A1 | PHOTORESIST COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| US-20110244394-A1 | METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110065044-A1 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110040056-A1 | PROCESS FOR PRODUCTION OF POLYMER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100316954-A1 | MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297551-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20090011362-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011362-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10564542-B2 | Photoresist compositions and methods | PARG, PNN, PARN | KDM4E 1509/4885NPC1 4506/4885POLB 391/4885 |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DCXR, RPS10, RRS1 | KDM4E 860/4885NPC1 4387/4885POLB 2013/4885 |
| US-10719014-B2 | Photoresists comprising amide component | ASPH, ALAD, SUN2 | KDM4E 692/4885NPC1 4560/4885POLB 2181/4885 |
| US-20100316954-A1 | MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | RRS1, CNKSR1, LSS | KDM4E 1628/4885NPC1 4646/4885POLB 3393/4885 |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | MAP1LC3C, LCP1, PIN1 | KDM4E 1748/4885NPC1 4411/4885POLB 2231/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.