⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL273731 | 1.00 | — | — | |
| Fluoride SCHEMBL148664 | 1.00 | — | — | |
| Fluoride SCHEMBL36953 | 1.00 | — | — | |
| Fluoride SCHEMBL6328976 | 1.00 | — | — | |
| Fluoride SCHEMBL81457 | 1.00 | — | — | |
| Fluoride SCHEMBL2012683 | 0.82 | — | — | |
| Fluoride SCHEMBL5358460 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL2150573 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL727736 | 0.82 | — | — | |
| Fluoride SCHEMBL8845175 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118877861-A | Preparation method of difluorophosphate | 深圳新宙邦科技股份有限公司 | 2024-11-01 | — | — | CN | claimed |
| EP-4357328-A2 | SYNTHESIS OF (E)-1,1,1,4,5,5,5-HEPTAFLUORO-4-(TRIFLUOROMETHYL)PENT-2-ENE | The Chemours Company FC, LLC (US) | 2024-04-24 | — | — | EP | claimed |
| US-20230052956-A1 | SYNTHESIS OF (E)-1,1,1,4,5,5,5-HEPTAFLUORO-4-(TRIFLUOROMETHYL)PENT-2-ENE | THE CHEMOURS COMPANY FC, LLC (US) | 2023-02-16 | — | — | US | claimed |
| EP-4093721-A1 | SYNTHESIS OF (E)-1,1,1,4,5,5,5-HEPTAFLUORO-4-(TRIFLUOROMETHYL)PENT-2-ENE | The Chemours Company FC, LLC (US) | 2022-11-30 | — | — | EP | claimed |
| CN-115003648-A | (E) Synthesis of (E) -1, 1, 1, 4, 5, 5, 5-heptafluoro-4- (trifluoromethyl) pent-2-ene | 科慕埃弗西有限公司 | 2022-09-02 | — | — | CN | claimed |
| WO-2021150801-A1 | SYNTHESIS OF (E)-1,1,1,4,5,5,5-HEPTAFLUORO-4-(TRIFLUOROMETHYL)PENT-2-ENE | THE CHEMOURS COMPANY FC, LLC (US) | 2021-07-29 | — | — | WO | claimed |
| JP-61111305-A | — | — | None | — | — | JP | disclosed |
| CN-122070270-A | Composition comprising 1, 3-tetrafluoropropene, method for the production thereof and use thereof | 科慕埃弗西有限公司 | 2026-05-19 | — | — | CN | disclosed |
| EP-4692042-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT | Mitsubishi Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4688999-A1 | REFRIGERANT COMPOSITIONS COMPRISING Z-1,3,3,3-TETRAFLUOROPROPENE, METHODS OF MAKING SAME, AND USES THEREOF | The Chemours Company FC, LLC (US) | 2026-02-11 | — | — | EP | disclosed |
| EP-4693286-A1 | PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, POLYMER, LARGE CAPACITY MEMORY, OPTICAL ELEMENT, AR LIGHT GUIDE PLATE, AND AR GLASSES | Mitsubishi Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260028312-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-01-29 | — | — | US | disclosed |
| US-20260023321-A1 | PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, POLYMER, LARGE CAPACITY MEMORY, OPTICAL ELEMENT, AR LIGHT GUIDE PLATE, AND AR GLASSES | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| US-20090098315-A1 | Photoreactive adhesive composition and liquid crystal panel prepared by using the same | SEKISUI FULLER CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| EP-1849808-A1 | CATIONICALLY CURABLE COMPOSITION AND CURED PRODUCT THEREOF | Asahi Kasei Chemicals Corporation (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-20060222999-A1 | Photosensitive composition and cured products thereof | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1657268-A1 | PHOTOSENSITIVE COMPOSITION AND CURED PRODUCT THEREOF | Asahi Kasei Chemicals Corporation (JP) | 2006-05-17 | — | — | EP | disclosed |
| EP-0536787-A1 | Process for converting polyketones to poly(keto-esters) | QUANTUM CHEMICAL CORPORATION (US) | 1993-04-14 | — | — | EP | disclosed |
| US-5140080-A | Reacting polyketone with aqueous hydrogen peroxide in the presence of a lewis acid and a carboxylic acid | QUANTUM CHEMICAL CORPORATION (US) | 1992-08-18 | — | — | US | disclosed |
| JP-S61111305-A | PRODUCTION OF POLAR GROUP-CONTAINING FLUOROCARBON POLYMER | TOKUYAMA SODA CO LTD | 1986-05-29 | — | — | JP | disclosed |