⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL27869390 | 0.84 | LMNA (0.42) | — | |
| SCHEMBL11113675 | 0.79 | — | — | |
| SCHEMBL1148199 | 0.79 | — | — | |
| SCHEMBL28105059 | 0.78 | — | — | |
| Acetone SCHEMBL27510055 | 0.77 | TSHR (0.55) | — | |
| SCHEMBL291550 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL23258 | 0.75 | — | — | |
| SCHEMBL29728550 | 0.75 | LMNA (0.48) | — | |
| SCHEMBL11101535 | 0.74 | — | — | |
| SCHEMBL9078713 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113402523-B | Targeted mast cell MrgX2 small-molecule fluorescent probe and preparation method and application thereof | 西安交通大学 | 2022-07-12 | — | — | CN | claimed |
| CN-113402523-A | Targeted mast cell MrgX2 small-molecule fluorescent probe and preparation method and application thereof | 西安交通大学 | 2021-09-17 | — | — | CN | claimed |
| CN-113402523-B | Targeted mast cell MrgX2 small-molecule fluorescent probe and preparation method and application thereof | 西安交通大学 | 2022-07-12 | — | — | CN | disclosed |
| CN-113402523-A | Targeted mast cell MrgX2 small-molecule fluorescent probe and preparation method and application thereof | 西安交通大学 | 2021-09-17 | — | — | CN | disclosed |
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-4772695-A | DEHYDROHALOGENATION, INSECTICIDES | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1988-09-20 | — | — | US | disclosed |