⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL75248 | 0.88 | TSHR (0.39) | — | |
| SCHEMBL239432 | 0.86 | — | — | |
| SCHEMBL22336636 | 0.86 | — | — | |
| SCHEMBL13263776 | 0.86 | — | — | |
| SCHEMBL13414939 | 0.85 | — | — | |
| SCHEMBL20103328 | 0.83 | — | — | |
| SCHEMBL15999589 | 0.81 | — | — | |
| SCHEMBL24436830 | 0.79 | TSHR (0.44) | — | |
| SCHEMBL12918648 | 0.78 | MEN1 (0.31) | — | |
| SCHEMBL5833449 | 0.77 | TSHR (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190203065-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| US-20190204741-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | ROHM & HAAS ELECT MAT (US) | 2019-07-04 | — | — | US | disclosed |
| US-20100297564-A1 | POLYMERIZABLE FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND METHOD OF FORMING RESIST PATTERN | DAIKIN INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |