⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL233353 | 1.00 | — | — | |
| SCHEMBL8583779 | 0.76 | — | — | |
| SCHEMBL9160145 | 0.72 | — | — | |
| SCHEMBL3925432 | 0.72 | — | — | |
| Acetic Acid SCHEMBL3683188 | 0.71 | FFAR3 (0.41) | — | |
| Acetic Acid SCHEMBL5145909 | 0.71 | FFAR3 (0.41) | — | |
| Oxalic Acid SCHEMBL28437631 | 0.71 | FFAR3 (0.35) | — | |
| Acetic Acid SCHEMBL1321915 | 0.71 | FFAR3 (0.41) | — | |
| Acetic Acid SCHEMBL29697739 | 0.71 | FFAR3 (0.41) | — | |
| Acetic Acid SCHEMBL540582 | 0.71 | FFAR3 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7837316-B2 | Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-11-23 | — | — | US | disclosed |
| US-7530682-B2 | Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090098308-A1 | CORRECTION INK FOR MICRO DEFECT OF COLOR PATTERN, COLOR FILTER, METHOD FOR CORRECTING MICRO DEFECT OF COLOR PATTERN, AND PROCESS FOR PRODUCING INK | TAWARAYA SEIJI | 2009-04-16 | — | — | US | disclosed |