⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27553224 | 1.00 | — | — | |
| SCHEMBL220819 | 0.97 | — | — | |
| SCHEMBL3696669 | 0.94 | — | — | |
| SCHEMBL11311561 | 0.94 | ALDH1A1 (0.41) | — | |
| Methane SCHEMBL4455400 | 0.94 | — | — | |
| Benzene SCHEMBL28198819 | 0.88 | FFAR3 (0.40) | — | |
| SCHEMBL4573923 | 0.88 | — | — | |
| SCHEMBL9307187 | 0.86 | ALDH1A1 (0.36) | — | |
| Octane SCHEMBL29098191 | 0.84 | NAAA (0.58) | — | |
| SCHEMBL1170200 | 0.84 | NAAA (0.58) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8354045-B2 | Ink composition and pattern forming method | SEIKO EPSON CORPORATION (JP) | 2013-01-15 | — | — | US | disclosed |
| US-20110050786-A1 | INK COMPOSITION AND PATTERN FORMING METHOD | SEIKO EPSON CORPORATION (JP) | 2011-03-03 | — | — | US | disclosed |
| US-7850875-B2 | Ink composition and pattern forming method | SEIKO EPSON CORPORATION (JP) | 2010-12-14 | — | — | US | disclosed |
| US-20080113098-A1 | INK COMPOSITION AND PATTERN FORMING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| US-5747570-A | POLYMERS OF UNSATURATED WATER ABSORBING MONOMER POLYSACCHARIDE, CROSSLINKNG GROUP, WATER AND THIOL | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1998-05-05 | — | — | US | disclosed |