SCHEMBL37673

SCHEMBL37673

CCONC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28003106 0.79 GAA (0.41)
SCHEMBL27278447 0.78
SCHEMBL840550 0.78
SCHEMBL1419529 0.77
SCHEMBL27646833 0.77 ALOX15 (0.46)
SCHEMBL1419531 0.77
SCHEMBL25702185 0.77
SCHEMBL1150638 0.77
SCHEMBL28804246 0.76 MGAM (0.40)
SCHEMBL19403965 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12448545-B2 Silicon carbide (SIC) wafer polishing with slurry formulation and process ARACA, INC. (US) 2025-10-21 US claimed
US-20250101261-A1 CHEMICAL MECHANICAL PLANARIZATION SLURRY PROCESSING TECHNIQUES AND SYSTEMS AND METHODS FOR POLISHING SUBSTRATE USING THE SAME ARACA, INC. 2025-03-27 US claimed
EP-4449481-A1 CHEMICAL MECHANICAL PLANARIZATION SLURRY PROCESSING TECHNIQUES AND SYSTEMS AND METHODS FOR POLISHING SUBSTRATE USING THE SAME Araca, Inc. (US) 2024-10-23 EP claimed
US-20240191101-A1 SILICON CARBIDE (SIC) WAFER POLISHING WITH SLURRY FORMULATION AND PROCESS ARACA, INC. 2024-06-13 US claimed
EP-4305118-A1 SILICON CARBIDE (SIC) WAFER POLISHING WITH SLURRY FORMULATION AND PROCESS Araca, Inc. (US) 2024-01-17 EP claimed
CN-116875130-A Fireproof matte black coating with high chemical resistance and preparation method thereof 千浪化研新材料(上海)有限公司 2023-10-13 CN claimed
WO-2023149925-A1 CHEMICAL MECHANICAL PLANARIZATION SLURRY PROCESSING TECHNIQUES AND SYSTEMS AND METHODS FOR POLISHING SUBSTRATE USING THE SAME ARACA, INC. (US) 2023-08-10 WO claimed
CN-116253662-A Method for preparing ethoxyamine 沈阳科创化学品有限公司 2023-06-13 CN claimed
WO-2022240842-A1 SILICON CARBIDE (SIC) WAFER POLISHING WITH SLURRY FORMULATION AND PROCESS ARACA, INC. (US) 2022-11-17 WO claimed
CN-106565707-B Pa Boxini novel synthesis 杭州科巢生物科技有限公司 2019-01-04 CN claimed
CN-1406123-B Skin normalizing agents SOKEN KK 2010-04-21 CN claimed
EP-2158198-A2 NOVEL N- (8HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN AstraZeneca AB (SE) 2010-03-03 EP claimed
US-20090233915-A1 5-Substituted-2-Phenylamino Benzamides as MEK Inhibitors CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2009-09-17 US claimed
WO-2008130320-A2 NOVEL N- (8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN ASTRAZENECA AB (SE) 2008-10-30 WO claimed
EP-1780197-A1 5-SUBSTITUTED-2-PHENYLAMINO-BENZAMIDE AS MEK INHIBITOR CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2007-05-02 EP claimed
CN-1235559-C Agent for improving skin moisture retention SOKEN KK (JP) 2006-01-11 CN claimed
CN-1663559-A Skin normalizing agents SOKEN KK (JP) 2005-09-07 CN claimed
CN-1406123-A Skin normalizing agents SOKEN KK (JP) 2003-03-26 CN claimed
CN-1292682-A Skin-care agent SOKEN KK (JP) 2001-04-25 CN claimed
EP-0720621-A1 RADIOLABELED SOMATOSTATIN-DERIVED PEPTIDES FOR IMAGING AND THERAPEUTIC USES Diatide, Inc. (US) 1996-07-10 EP claimed