Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 2/20 | 0.58 |
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | TPMT | P51580 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HCAR1 | Q9BXC0 | 1/20 | 0.43 |
| ▸ | DAO | P14920 | 1/20 | 0.43 |
| ▸ | PLAU | P00749 | 1/20 | 0.43 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.42 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.42 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.42 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.42 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11257407 | 0.88 | TPMT (0.56) | TTRTSHRTPMTCYP3A4ALDH1A1 | |
| SCHEMBL7263572 | 0.85 | TTR (0.68) | TTRTSHRTPMTCYP3A4SRD5A2 | |
| Fluoride SCHEMBL27668632 | 0.83 | TTR (0.65) | TTRTSHRTPMTCYP3A4SRD5A2 | |
| SCHEMBL27214470 | 0.81 | ALDH1A1 (0.46) | TTRTSHRTPMTCYP3A4ALDH1A1 | |
| SCHEMBL10770976 | 0.80 | TTR (0.56) | TTRTSHRTPMTSRD5A2ALDH1A1 | |
| SCHEMBL1614866 | 0.79 | AKR1C4 (0.65) | TSHRTPMTCYP3A4SRD5A2ALDH1A1 | |
| SCHEMBL27610170 | 0.78 | TTR (0.54) | TTRTSHRTPMTSRD5A2ALDH1A1 | |
| SCHEMBL11679297 | 0.78 | TTR (0.54) | TTRTSHRTPMTSRD5A2ALDH1A1 | |
| SCHEMBL28675233 | 0.78 | CYP3A4 (0.68) | TTRTSHRTPMTCYP3A4ALDH1A1 | |
| SCHEMBL8779295 | 0.78 | TTR (0.54) | TTRTSHRTPMTCYP3A4ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4042571-A | Fire-retardant polyamides from naphthalene dicarboxylic reactant and halogenated carboxylic reactant | TEIJIN LIMITED (JA) | 1977-08-16 | — | — | US | claimed |
| US-11372330-B2 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-20090117493-A1 | Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-07 | — | — | US | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1939688-A1 | COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2008-07-02 | — | — | EP | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| US-4042571-A | Fire-retardant polyamides from naphthalene dicarboxylic reactant and halogenated carboxylic reactant | TEIJIN LIMITED (JA) | 1977-08-16 | — | — | US | disclosed |