SCHEMBL3774780

SCHEMBL3774780

CCC(C)(C)c1cc(C)c(N)cc1N

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.43
CYP1A2 P05177 1/20 0.43
ALOX15 P16050 1/20 0.43
CASP7 P55210 1/20 0.43
HIF1A Q16665 1/20 0.43
HSD17B10 Q99714 1/20 0.43
CYP3A4 P08684 3/20 0.41
TSHR P16473 2/20 0.41
MAPK1 P28482 1/20 0.41
ESR1 P03372 2/20 0.37
AR P10275 2/20 0.37
ESR2 Q92731 1/20 0.37
S100B P04271 1/20 0.33
TERT O14746 1/20 0.33
SKP2 Q13309 1/20 0.32
TDP1 Q9NUW8 2/20 0.32
CASP1 P29466 1/20 0.32
NPC1 O15118 3/20 0.32
RAB9A P51151 3/20 0.32
MAPT P10636 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL168392 0.78 CYP3A4 (0.48) ALDH1A1CYP1A2ALOX15CASP7HIF1A
SCHEMBL30301248 0.78 CYP3A4 (0.48) ALDH1A1CYP1A2ALOX15CASP7HIF1A
SCHEMBL9721931 0.75 POLB (0.40) ALDH1A1CYP3A4TSHRESR1AR
SCHEMBL10408240 0.72 KDM4E (0.36) ALDH1A1ESR1ARESR2S100B
SCHEMBL28386489 0.71 POLB (0.34) NPC1RAB9AMAPTPOLB
SCHEMBL10582996 0.71 MAPT (0.43) ALDH1A1CASP7CYP3A4TSHRMAPK1
SCHEMBL10492549 0.71 ESR1 (0.45) ALDH1A1CYP1A2ALOX15CASP7HIF1A
SCHEMBL24910873 0.70 CYP3A4 (0.50) ALDH1A1CYP1A2ALOX15CASP7HIF1A
SCHEMBL10620353 0.69 POLB (0.39) ALDH1A1CYP3A4TSHRTDP1POLB
SCHEMBL10448038 0.69 KDM4E (0.37) ALDH1A1TSHRTDP1CASP1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9827646-B2 Polishing pad and preparing method thereof FNS TECH CO., LTD. (KR) 2017-11-28 US claimed
US-20170129072-A1 Porous Polishing Pad and Preparing Method of the Same FNS TECH CO., LTD. (KR) 2017-05-11 US claimed
US-20160339559-A1 POLISHING PAD AND PREPARING METHOD THEREOF FNS Tech. Co., Ltd. (KR) 2016-11-24 US claimed
US-8431489-B2 Chemical mechanical polishing pad having a low defect window ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2013-04-30 US claimed
US-20120295442-A1 Chemical mechanical polishing pad having a low defect window ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2012-11-22 US claimed
US-8257544-B2 Chemical mechanical polishing pad having a low defect integral window ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2012-09-04 US claimed
EP-0855414-B1 Polyurethane prepolymers for making elastomers having improved dynamic properties AIR PROD & CHEM (US) 2004-10-06 EP claimed
US-6730311-B2 PICTURE FRAME ASSEMBLY SCENTED TECHNOLOGIES, LLC 2004-05-04 US claimed
US-20040057975-A1 Air fresheners comprising polyurethane/polyurea matrices for the delivery of fragrance agents MALEENY ROBERT T (US) 2004-03-25 US claimed
US-20030017129-A1 Air fresheners comprising polyurethane/polyurea matrices for the delivery of fragrance agents SCENTED TECHNOLOGIES, LLC, A CORPORATION OF THE STATE OF NEW JERSEY 2003-01-23 US claimed
US-6375966-B1 Polyurethane/polyurea matrices for the delivery of active agents SCENTED TECHNOLOGIES, LLC 2002-04-23 US claimed
WO-2001091551-A1 POLYURETHANE/POLYUREA MATRICES FOR THE DELIVERY OF ACTIVE AGENTS FLAVOR & FRAGRANCE SPECIALTIES (US) 2001-12-06 WO claimed
US-5821316-A POLYETHERURETHANES AND POLYUREAURETHANES FORMED BY CONDENSATION POLYMERIZATION OF DIISOCYANATES AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-10-13 US claimed
EP-0855414-A1 Polyurethane prepolymers for making elastomers having improved dynamic properties AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-07-29 EP claimed
US-4816543-A REACTIN INJECTION MOLDING MATERIALS AIR PRODUCTS AND CHEMICALS, INC. (US) 1989-03-28 US claimed
CN-118024153-B PH value self-adaptive chemical mechanical polishing pad, preparation method and application thereof 万华化学集团电子材料有限公司 2026-05-19 CN disclosed
CN-115476267-B Isocyanate prepolymer, polishing pad comprising same, polishing equipment and manufacturing method of semiconductor device 湖北鼎汇微电子材料有限公司 2025-04-29 CN disclosed
US-6730311-B2 PICTURE FRAME ASSEMBLY SCENTED TECHNOLOGIES, LLC 2004-05-04 US disclosed
US-20040057975-A1 Air fresheners comprising polyurethane/polyurea matrices for the delivery of fragrance agents MALEENY ROBERT T (US) 2004-03-25 US disclosed
US-20030017129-A1 Air fresheners comprising polyurethane/polyurea matrices for the delivery of fragrance agents SCENTED TECHNOLOGIES, LLC, A CORPORATION OF THE STATE OF NEW JERSEY 2003-01-23 US disclosed