⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL89079 | 0.89 | PGK1 (0.31) | — | |
| Ammonia Solution, Strong SCHEMBL89965 | 0.86 | PGK1 (0.30) | — | |
| SCHEMBL87741 | 0.79 | — | — | |
| SCHEMBL720356 | 0.77 | PGK1 (0.30) | — | |
| Ammonia Solution, Strong SCHEMBL7056618 | 0.77 | PGK1 (0.30) | — | |
| SCHEMBL377698 | 0.77 | — | — | |
| Ammonia Solution, Strong SCHEMBL8940794 | 0.77 | PGK1 (0.30) | — | |
| SCHEMBL1170282 | 0.77 | PGK1 (0.30) | — | |
| SCHEMBL2099614 | 0.74 | — | — | |
| Diethanolamine SCHEMBL90545 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112745853-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-112824482-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | claimed |
| EP-3557684-B1 | LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME | MITSUBISHI CHEM CORP (JP) | 2024-01-24 | — | — | EP | claimed |
| CN-112779014-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-112521946-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-110655924-B | Silicon substrate etching solution | OCI有限公司 | 2022-11-04 | — | — | CN | claimed |
| EP-3527639-B1 | A METHOD FOR BONDING A THERMOPLASTIC MATERIAL BY MICROWAVE-IRRADIATION | PROIONIC GMBH (AT) | 2021-09-08 | — | — | EP | claimed |
| US-11084954-B2 | Method for curing an adhesive using microwave irradiation | PROIONIC GMBH (AT) | 2021-08-10 | — | — | US | claimed |
| CN-112824482-A | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2021-05-21 | — | — | CN | claimed |
| CN-112779014-A | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2021-05-11 | — | — | CN | claimed |
| EP-2812413-B1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2016-03-16 | — | — | EP | claimed |
| US-20150008373-A1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2015-01-08 | — | — | US | claimed |
| EP-2812413-A1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | Merck Patent GmbH (DE) | 2014-12-17 | — | — | EP | claimed |
| WO-2013117284-A1 | REACTIVE MESOGEN FORMULATION WITH CONDUCTIVE ADDITIVE | MERCK PATENT GMBH (DE) | 2013-08-15 | — | — | WO | claimed |
| US-7501522-B2 | Method for the production of purified 1,3-substituted imidazolium salts | BASF AKTIENGESELLSCHAFT (DE) | 2009-03-10 | — | — | US | claimed |
| EP-1786776-B1 | METHOD FOR PRODUCING HIGH-PURITY QUATERNARY AMMONIUM COMPOUNDS | BASF SE (DE) | 2008-12-03 | — | — | EP | claimed |
| US-20080033209-A1 | Method For High-Purity Quaternary Ammonium Compounds | BASF AKTIENGSELLSCHAFT (DE) | 2008-02-07 | — | — | US | claimed |
| US-20080009633-A1 | Method for Producing High-Purity Quaternary Ammonium Compounds | BASF AKTIENGESELLSCHAFT (DE) | 2008-01-10 | — | — | US | claimed |
| EP-1651614-B1 | METHOD FOR THE PRODUCTION OF PURIFIED 1,3-SUBSTITUTED IMIDAZOLIUM SALTS | BASF AG (DE) | 2007-07-11 | — | — | EP | claimed |
| US-20060149074-A1 | Method for the production of purified 1,3-substituted imidazolium salts | BASF AKTIENGESELLSCHAFT (DE) | 2006-07-06 | — | — | US | claimed |