⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3775203 | 0.90 | LMNA (0.31) | — | |
| SCHEMBL13016282 | 0.89 | LMNA (0.30) | — | |
| SCHEMBL13016044 | 0.87 | — | — | |
| SCHEMBL13016077 | 0.83 | — | — | |
| SCHEMBL13016220 | 0.78 | — | — | |
| SCHEMBL19929350 | 0.77 | TSHR (0.38) | — | |
| SCHEMBL13016287 | 0.76 | — | — | |
| SCHEMBL14649939 | 0.75 | — | — | |
| SCHEMBL14649940 | 0.75 | — | — | |
| SCHEMBL775364 | 0.74 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9221785-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9221785-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-8492562-B2 | (Meth)acrylate derivative, intermediate thereof, and polymer compound | KURARAY CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8492562-B2 | (Meth)acrylate derivative, intermediate thereof, and polymer compound | KURARAY CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8492562-B2 | (Meth)acrylate derivative, intermediate thereof, and polymer compound | KURARAY CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-20100331508-A1 | (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND | KURARAY CO., LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100331508-A1 | (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND | KURARAY CO., LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100331508-A1 | (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND | KURARAY CO., LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| WO-2009104726-A1 | (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND | 株式会社クラレ (JP) | 2009-08-27 | — | — | WO | disclosed |