SCHEMBL378577

SCHEMBL378577

C[Si](C)(C)N1CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL918211 0.96 MGLL (0.30)
SCHEMBL8380773 0.96 MGLL (0.30)
SCHEMBL11793916 0.93
SCHEMBL11792286 0.92
SCHEMBL8077052 0.90
SCHEMBL11799504 0.89
SCHEMBL9980594 0.84
SCHEMBL11789995 0.84
SCHEMBL18103915 0.79
SCHEMBL8647505 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 576 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12628623-B2 Selective deposition for sub 20 nm pitch EUV patterning APPLIED MATERIALS, INC. (US) 2026-05-12 US claimed
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US claimed
US-20250239445-A1 METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS APPLIED MATERIALS, INC. (US) 2025-07-24 US claimed
CN-113594171-B Integrated assembly and method of forming an integrated assembly 美光科技公司 2024-06-18 CN claimed
US-20240183035-A1 AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION APPLIED MATERIALS, INC. (US) 2024-06-06 US claimed
WO-2024112550-A1 AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION APPLIED MATERIALS, INC. (US) 2024-05-30 WO claimed
US-20240083926-A1 PHOSPHORUS COMPOUNDS AND METHODS THEREOF AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2024-03-14 US claimed
US-11915936-B2 Semiconductor structure and manufacturing method thereof TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2024-02-27 US claimed
US-20240055255-A1 SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING APPLIED MATERIALS, INC. (US) 2024-02-15 US claimed
WO-2024030572-A1 SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING APPLIED MATERIALS, INC. (US) 2024-02-08 WO claimed
EP-1318160-B1 Catalysts and process for the preparation of isocyanurate group containing polyisocyanates and their use DEGUSSA (DE) 2007-09-26 EP claimed
EP-1318152-B1 Catalysts and process for preparing polyisocyanates containing isocyanurate groups DEGUSSA (DE) 2007-09-19 EP claimed
EP-0954558-B1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 2006-06-14 EP claimed
US-6875243-B2 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2005-04-05 US claimed
US-20050044778-A1 Fuel compositions employing catalyst combustion structure OCTANE INTERNATIONAL, LTD. 2005-03-03 US claimed
US-20030135007-A1 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2003-07-17 US claimed
US-20030109665-A1 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2003-06-12 US claimed
EP-1318152-A2 Catalysts and process for preparing polyisocyanates containing isocyanurate groups and their use Degussa AG (DE) 2003-06-11 EP claimed
EP-1318160-A1 Catalysts and process for the preparation of isocyanurate group containing polyisocyanates and their use Degussa AG (DE) 2003-06-11 EP claimed
US-6365643-B1 Photoinitiators for cationic curing TH. GOLDSCHMIDT AG (DE) 2002-04-02 US claimed