SCHEMBL3785817

SCHEMBL3785817

CC(=CC(C)OCC(F)(F)C(F)(F)C(F)(F)C(F)F)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.33
MAPT P10636 1/20 0.33
TSHR P16473 1/20 0.33
CYP1A2 P05177 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3784649 0.87
SCHEMBL3791235 0.83
SCHEMBL3781457 0.82 POLB (0.35) MAPTTSHR
SCHEMBL3788015 0.80 HTT (0.34)
SCHEMBL3780801 0.80
SCHEMBL3780275 0.75
SCHEMBL3781531 0.73 POLB (0.36) MAPT
SCHEMBL1733416 0.72 KDM4E (0.31) TSHR
SCHEMBL1005512 0.72 KDM4E (0.31) TSHR
SCHEMBL4952267 0.72 KDM4E (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858288-B2 Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2010-12-28 US disclosed
US-20080268376-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-30 US disclosed