SCHEMBL3781457

SCHEMBL3781457

CC(=CC(C)OCC(F)(F)C(F)F)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
MAPT P10636 1/20 0.32
GAA P10253 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3781531 0.87 POLB (0.36) POLBTDP1ALDH1A1NPSR1MAPT
SCHEMBL3788015 0.85 HTT (0.34) ALDH1A1
SCHEMBL3791235 0.82
SCHEMBL3785817 0.82 USP2 (0.33) MAPTTSHR
SCHEMBL3784649 0.79
SCHEMBL3787743 0.76
SCHEMBL3780801 0.76
SCHEMBL3786703 0.75 PLA2G2C (0.33) ALDH1A1
SCHEMBL465965 0.73 LMNA (0.33) ALDH1A1
SCHEMBL126033 0.73 LMNA (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858288-B2 Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2010-12-28 US disclosed
US-20080268376-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-30 US disclosed