Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3791235 | 0.86 | — | — | |
| SCHEMBL3786703 | 0.85 | PLA2G2C (0.33) | HTTALDH1A1 | |
| SCHEMBL3781457 | 0.85 | POLB (0.35) | ALDH1A1 | |
| SCHEMBL3784649 | 0.83 | — | — | |
| SCHEMBL3785817 | 0.80 | USP2 (0.33) | — | |
| SCHEMBL126033 | 0.77 | LMNA (0.33) | ALDH1A1 | |
| SCHEMBL465965 | 0.77 | LMNA (0.33) | ALDH1A1 | |
| SCHEMBL3787320 | 0.77 | — | — | |
| SCHEMBL3785521 | 0.76 | — | — | |
| SCHEMBL3787743 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858288-B2 | Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20080268376-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-30 | — | — | US | disclosed |