SCHEMBL3786123

SCHEMBL3786123

C=CCNN(C)CC(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.36
EYA2 O00167 1/20 0.36
APP P05067 1/20 0.36
ACE P12821 1/20 0.36
TSHR P16473 2/20 0.34
KDM4E B2RXH2 1/20 0.34
LMNA P02545 1/20 0.34
CHRM2 P08172 1/20 0.34
ADRA2A P08913 1/20 0.34
ALOX15 P16050 1/20 0.34
DRD1 P21728 1/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
CYP2C19 P33261 1/20 0.34
ADRA1A P35348 1/20 0.34
DRD3 P35462 1/20 0.34
BLM P54132 1/20 0.34
PMP22 Q01453 1/20 0.34
SLC6A3 Q01959 1/20 0.34
HRH3 Q9Y5N1 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3453847 0.78 TDP1 (0.39) TDP1EYA2APPACETSHR
SCHEMBL1551330 0.76 TDP1 (0.33) TDP1EYA2APPACETSHR
Hydrochloric Acid SCHEMBL437243 0.75 FAAH (0.33) TDP1EYA2APPACETSHR
SCHEMBL3435871 0.75 FAAH (0.36) TDP1EYA2APPACETSHR
SCHEMBL7600756 0.73 TDP1 (0.34) TDP1EYA2APPACETSHR
SCHEMBL27712183 0.73 SMN1; SMN2 (0.35) TDP1EYA2APPACETSHR
SCHEMBL8817028 0.72 TDP1 (0.33) TDP1EYA2APPACETSHR
SCHEMBL17226154 0.70
SCHEMBL19072115 0.70
SCHEMBL30589460 0.70 PHF8 (0.40) TDP1EYA2APPACEKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10144849-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2018-12-04 US disclosed
US-20100301014-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2010-12-02 US disclosed
EP-2237311-A1 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2010-10-06 EP disclosed