SCHEMBL3786703

SCHEMBL3786703

CC(=CC(C)OCCOCC(F)(F)F)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PLA2G2C Q5R387 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3787320 0.88
SCHEMBL3781531 0.87 POLB (0.36) ALDH1A1
SCHEMBL3780275 0.86
SCHEMBL3788015 0.85 HTT (0.34) ALDH1A1HTT
SCHEMBL3780801 0.85
SCHEMBL3783265 0.81
SCHEMBL11686601 0.81 ALDH1A1 (0.41) ALDH1A1
SCHEMBL21630434 0.77 ALDH1A1 (0.31) ALDH1A1
SCHEMBL3785521 0.77
SCHEMBL3791235 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858288-B2 Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2010-12-28 US disclosed
US-20080268376-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-30 US disclosed