SCHEMBL3789442

SCHEMBL3789442

CC(=O)/C=C(\C)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL746417 1.00
SCHEMBL21589352 0.81
SCHEMBL370991 0.81
SCHEMBL370990 0.81
SCHEMBL301898 0.79
SCHEMBL301897 0.79
SCHEMBL1233238 0.79
SCHEMBL15616906 0.77
SCHEMBL19451628 0.77
SCHEMBL1029352 0.77 LMNA (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110431926-A Electromagnetic wave shielding member FUJIFILM CORP 2019-11-08 CN disclosed
CN-105198793-B Oxime ester photoinitiators 巴斯夫欧洲公司 2019-08-13 CN disclosed
CN-104395834-B The method for recycling of development treatment waste liquid method for concentration and development treatment waste liquid 富士胶片株式会社 2019-07-05 CN disclosed
CN-109791361-A Positive lithographic printing plate precursor, method for producing same, and method for producing lithographic printing plate 富士胶片株式会社 2019-05-21 CN disclosed
CN-109715855-A The manufacturing method of perforated metal foil 富士胶片株式会社 2019-05-03 CN disclosed
CN-104813231-B Photo-hardening composition, transfer materials, hardening thing and its manufacturing method, resin pattern manufacturing method, cured film and its application 富士胶片株式会社 2018-12-04 CN disclosed
CN-103650044-B Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/playback method 富士胶片株式会社 2017-02-22 CN disclosed
EP-2817379-A1 ADHESIVE FOR PRODUCING COMPOSITE BODIES, PREFERABLY OF A PLASTIC-GLASS COMPOSITE OR COMPOSITE GLASS, FOR ARCHITECTURE AND CONSTRUCTION Evonik Industries AG (DE) 2014-12-31 EP disclosed
WO-2013124210-A1 ADHESIVE FOR PRODUCING COMPOSITE BODIES, PREFERABLY OF A PLASTIC-GLASS COMPOSITE OR COMPOSITE GLASS, FOR ARCHITECTURE AND CONSTRUCTION EVONIK INDUSTRIES AG (DE) 2013-08-29 WO disclosed
EP-2144967-A2 SURFACE-MODIFIED NANOPARTICLES COMPRISING A CATIONIC COLORANT FOR USE IN COLOR FILTERS BASF SE (DE) 2010-01-20 EP disclosed
EP-1789418-A1 COMPOSITIONS CONTAINING PHTHALOCYANINE DYES Huntsman Advanced Materials (Switzerland) GmbH (CH) 2007-05-30 EP disclosed
WO-2007054745-A2 A BIOCIDAL FILM-FORMING COMPOSITION AND METHOD FOR COATING SURFACES WITH IT BIOTECH INTERNATIONAL LIMITED (GB) 2007-05-18 WO disclosed
EP-1784449-A1 COMPOSITIONS CONTAINING ANTHRAQUINONE DYES Huntsman Advanced Materials (Switzerland) GmbH (CH) 2007-05-16 EP disclosed
WO-2006037728-A1 USE OF PYRIMIDO[5,4-G]PTERIDINES AS SHADING COMPONENT IN COLOR FILTER COLORANT COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2006-04-13 WO disclosed
WO-2006024617-A1 COMPOSITIONS CONTAINING ANTHRAQUINONE DYES HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2006-03-09 WO disclosed
WO-2006024618-A1 CYANOPYRIDINE-BASED AZO DYES HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2006-03-09 WO disclosed
WO-2006024619-A1 COMPOSITIONS CONTAINING PHTHALOCYANINE DYES HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2006-03-09 WO disclosed
CN-1422743-A Driginal plate of plate-printing board FUJI PHOTO FILM CO LTD (JP) 2003-06-11 CN disclosed
WO-2003029310-A1 METHOD AND DEVICE FOR PRODUCING A HIGHLY MOLECULAR POLY(METH)ACRYLATE RÖHM GBMH & CO.KG (DE) 2003-04-10 WO disclosed
WO-2002022267-A2 EXTERNALLY CONTROLLABLE SURFACE COATINGS FOR MICROFLUIDIC DEVICES MICRONICS, INC. (US) 2002-03-21 WO disclosed