SCHEMBL3789665

SCHEMBL3789665

NC(=O)OCCC[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1546 0.83
SCHEMBL2745809 0.83 LMNA (0.52)
SCHEMBL2746597 0.83 TSHR (0.52)
Ammonia Solution, Strong SCHEMBL10897945 0.80 LMNA (0.50)
SCHEMBL2136691 0.80 TSHR (0.50)
SCHEMBL31296577 0.80 TSHR (0.50)
SCHEMBL2059697 0.80 TSHR (0.50)
SCHEMBL5721317 0.80 TSHR (0.50)
SCHEMBL2746089 0.80 TSHR (0.50)
SCHEMBL2139712 0.80 TSHR (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109414396-A Cosmetic preparation 信越化学工业株式会社 2019-03-01 CN disclosed
CN-107072931-B Oil-based cosmetic preparation 株式会社资生堂 2018-10-16 CN disclosed
CN-107428790-A dextrin fatty acid ester and cosmetics 千叶制粉株式会社 2017-12-01 CN disclosed
CN-107365395-A Organosiloxane grafting polyvinyl alcohol based polymer and its manufacture method 信越化学工业株式会社 2017-11-21 CN disclosed
CN-107072931-A Oil-based cosmetic preparation 株式会社资生堂 2017-08-18 CN disclosed
US-20100292509-A1 VEGFC PRODUCTION PROMOTER SHISEIDO COMPANY, LTD 2010-11-18 US disclosed