SCHEMBL379171

SCHEMBL379171

C=C(C)C(=O)OCCO[Si](OC)(OC)OC

nearest known ligand 0.53

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.53
TSHR P16473 3/20 0.47
ALDH1A1 P00352 2/20 0.41
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9560047 0.96 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL9559753 0.96 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL65533 0.90 THRB (0.59) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL3366378 0.89 TSHR (0.58) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL2228744 0.89 TSHR (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL17391514 0.83 THRB (0.61) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL17391455 0.83 THRB (0.61) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL17391608 0.83 THRB (0.61) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL2028631 0.81 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
Methoxymethane SCHEMBL18258574 0.81 THRB (0.68) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1365915-A4 POLYMER GEL CONTACT MASKS AND METHODS AND MOLDS FOR MAKING SAME SURFACE LOGIX INC (US) 2008-06-25 EP claimed
EP-1365915-A1 POLYMER GEL CONTACT MASKS AND METHODS AND MOLDS FOR MAKING SAME Surface Logix, Inc. (US) 2003-12-03 EP claimed
WO-2002036342-A1 POLYMER GEL CONTACT MASKS AND METHODS AND MOLDS FOR MAKING SAME SURFACE LOGIX, INC. (US) 2002-05-10 WO claimed
JP-6033015-A None JP disclosed
JP-5255349-A None JP disclosed
JP-4308595-A None JP disclosed
CN-114644738-B Active nano emulsion and preparation method thereof 清华大学 2023-07-14 CN disclosed
CN-114644738-A Active nano latex and preparation method thereof 清华大学 2022-06-21 CN disclosed
US-9653765-B2 Gas diffusion electrodes for batteries such as metal-air batteries LIOX POWER, INC. (US) 2017-05-16 US disclosed
US-20130089795-A1 GAS DIFFUSION ELECTRODES FOR BATTERIES SUCH AS METAL-AIR BATTERIES LIOX POWER, INC. 2013-04-11 US disclosed
EP-2109436-B1 ADHESIVE COMPOSITION FOR HARD TISSUE 3M INNOVATIVE PROPERTIES CO (US) 2012-01-25 EP disclosed
EP-0578498-A2 Acrylic polymer, its use and process for producing it NIPPON SHOKUBAI CO., LTD. (JP) 1994-01-12 EP disclosed
JP-H05255349-A PRODUCTION OF REACTIVE ORGANOSILICON COMPOUND NIPPON SHOKUBAI CO LTD 1993-10-05 JP disclosed
JP-H04308595-A PRODUCTION OF MONO-EXCHANGER COMPOUND IN ORGANOSILICONE COMPOUND NIPPON SHOKUBAI CO LTD 1992-10-30 JP disclosed
US-5035971-A Latex particles, dispersion stabilizer is acid group endcapped addition polymer FUJI PHOTO FILM CO., LTD. (JP) 1991-07-30 US disclosed
EP-0392797-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-10-17 EP disclosed
EP-0376650-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-07-04 EP disclosed
EP-0366491-A2 Liquid developers for electrophotography FUJI PHOTO FILM CO., LTD. (JP) 1990-05-02 EP disclosed
EP-0366447-A2 Electrostatic photographic liquid developer FUJI PHOTO FILM CO., LTD. (JP) 1990-05-02 EP disclosed
EP-0366492-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-05-02 EP disclosed