SCHEMBL3795211

SCHEMBL3795211

C[Si](C)(O[Si](C)(C)C1CC2CC1C(C(=O)O)C2C(=O)O)O[Si](C)(C)C1CC2CC1C1C(=O)OC(=O)C21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15021861 1.00
SCHEMBL15021248 1.00
SCHEMBL15224171 0.99
SCHEMBL5072202 0.95
SCHEMBL2719986 0.87 KDM4E (0.32)
SCHEMBL14480328 0.85 PPM1B (0.31)
SCHEMBL6661239 0.81 KDM4E (0.34)
SCHEMBL3795208 0.80 PPM1B (0.31)
SCHEMBL15033323 0.80
SCHEMBL18031714 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8592546-B2 Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-26 US disclosed
US-8524921-B2 Liquid tetracarboxylic dianhydrides and process for the preparation thereof HITACHI CHEMICAL CO., LTD. (JP) 2013-09-03 US disclosed
US-20130158225-A1 NOVEL SILICON-CONTAINING ALICYCLIC POLYIMIDE RESIN, POLYAMIC ACID RESIN, AND MANUFACTURING METHOD FOR SAME RESONAC CORPORATION (JP) 2013-06-20 US disclosed
US-20110301362-A1 NOVEL LIQUID TETRACARBOXYLIC DIANHYDRIDES AND PROCESS FOR THE PREPARATION THEREOF HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-12-08 US disclosed
JP-2010254602-A SILICON-CONTAINING ALICYCLIC TETRACARBOXYLIC DIANHYDRIDE AND METHOD FOR SEPARATING AND PURIFYING THE SAME HITACHI CHEM CO LTD 2010-11-11 JP disclosed