SCHEMBL5072202

SCHEMBL5072202

C[Si](C)(O[Si](C)(C)C1CC2CC1C1C(=O)OC(=O)C21)C1CC2CC1C(C(=O)O)C2C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3795211 0.95
SCHEMBL15021861 0.95
SCHEMBL15021248 0.95
SCHEMBL15224171 0.94
SCHEMBL6661239 0.86 KDM4E (0.34)
SCHEMBL2719986 0.81 KDM4E (0.32)
SCHEMBL5072200 0.79 PPM1B (0.33)
SCHEMBL14480328 0.79 PPM1B (0.31)
SCHEMBL14286668 0.79
SCHEMBL15235662 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070295956-A1 Optoelectronic device GELCORE LLC 2007-12-27 US claimed
US-4795680-A Polyimide-siloxanes, method of making and use GENERAL ELECTRIC COMPANY (US) 1989-01-03 US claimed
US-8592546-B2 Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-26 US disclosed
US-8524921-B2 Liquid tetracarboxylic dianhydrides and process for the preparation thereof HITACHI CHEMICAL CO., LTD. (JP) 2013-09-03 US disclosed
US-20130158225-A1 NOVEL SILICON-CONTAINING ALICYCLIC POLYIMIDE RESIN, POLYAMIC ACID RESIN, AND MANUFACTURING METHOD FOR SAME RESONAC CORPORATION (JP) 2013-06-20 US disclosed
US-20110301362-A1 NOVEL LIQUID TETRACARBOXYLIC DIANHYDRIDES AND PROCESS FOR THE PREPARATION THEREOF HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-12-08 US disclosed
US-20080001140-A1 Optoelectronic device GELCORE LLC 2008-01-03 US disclosed
US-20070295956-A1 Optoelectronic device GELCORE LLC 2007-12-27 US disclosed
US-5206312-A Polysiloxanes hydrosilated with unsaturated aromatic alcohols and siloxy-containing compounds having hydroxy groups to advance polyepoxides and epoxy resins; electronics; coatings; composites THE DOW CHEMICAL COMPANY (US) 1993-04-27 US disclosed
US-5188903-A Coatings THE DOW CHEMICAL COMPANY (US) 1993-02-23 US disclosed
EP-0112845-B1 METHOD FOR MAKING SILYLNORBORNANE ANHYDRIDES GENERAL ELECTRIC COMPANY (US) 1989-07-12 EP disclosed
EP-0113357-B1 SILICONE-IMIDE COPOLYMERS AND METHOD FOR MAKING GENERAL ELECTRIC COMPANY (US) 1986-09-24 EP disclosed
US-4598135-A Method for making norbornane anhydride substituted polyorganosiloxane GENERAL ELECTRIC COMPANY (US) 1986-07-01 US disclosed
US-4582886-A IMIDOAMINO NORBORNANE-FUNCTIONAL ORGANOSILOXANES; HEAT AND OXIDATION RESISTANCE GENERAL ELECTRIC COMPANY (US) 1986-04-15 US disclosed
US-4511701-A SILYLNORBORNENE ANHYDRIDE OR IMIDOAMINE GENERAL ELECTRIC COMPANY (US) 1985-04-16 US disclosed
EP-0113357-A1 SILICONE-IMIDE COPOLYMERS AND METHOD FOR MAKING. GEN ELECTRIC (US) 1984-07-18 EP disclosed
EP-0112845-A1 METHOD FOR MAKING SILYLNORBORNANE ANHYDRIDES. GEN ELECTRIC (US) 1984-07-11 EP disclosed
WO-1984000374-A1 SILICONE-IMIDE COPOLYMERS AND METHOD FOR MAKING GEN ELECTRIC (US) 1984-02-02 WO disclosed
WO-1984000366-A1 SILYLNORBORNANE ANHYDRIDES AND METHOD FOR MAKING GEN ELECTRIC (US) 1984-02-02 WO disclosed
US-4381396-A Silynorbornane anhydrides and method for making GENERAL ELECTRIC COMPANY (US) 1983-04-26 US disclosed