SCHEMBL3801152

SCHEMBL3801152

O=C1C=CC(=O)N1c1ccc(Cc2cccc(N3C(=O)C=CC3=O)c2)cc1

nearest known ligand 0.72

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 15/20 0.72
FAAH O00519 7/20 0.72
HSP90AA1 P07900 3/20 0.54
ALDH1A1 P00352 2/20 0.54
PKM P14618 2/20 0.54
HTT P42858 2/20 0.54
ATM Q13315 1/20 0.54
PARP1 P09874 1/20 0.53
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
XBP1 P17861 1/20 0.47
MAPK1 P28482 1/20 0.47
CCR6 P51684 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
HPN P05981 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1683222 0.93 MGLL (0.73) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL31664393 0.93 MGLL (0.73) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL30508999 0.91 MGLL (0.60) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL2900691 0.85 MGLL (0.84) MGLLFAAHHSP90AA1PKMMAPK1
SCHEMBL114168 0.85 MGLL (1.00) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL23368250 0.82 MGLL (0.60) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL21215695 0.80 MGLL (0.88) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL10581467 0.80 MGLL (0.88) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL2596734 0.79 MGLL (0.72) MGLLFAAHHSP90AA1PKMMAPK1
SCHEMBL486546 0.79 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8796393-B2 Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-08-05 US disclosed
US-20130131282-A1 PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-05-23 US disclosed
US-20100304291-A1 PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-02 US disclosed