Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 4/20 | 0.73 |
| ▸ | MAOA | P21397 | 2/20 | 0.73 |
| ▸ | ACHE | P22303 | 3/20 | 0.69 |
| ▸ | MIF | P14174 | 5/20 | 0.64 |
| ▸ | BCHE | P06276 | 1/20 | 0.63 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.60 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.58 |
| ▸ | TNF | P01375 | 2/20 | 0.58 |
| ▸ | CES2 | O00748 | 2/20 | 0.55 |
| ▸ | STK17B | O94768 | 1/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30298462 | 1.00 | MAOB (0.73) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL16312876 | 1.00 | MAOB (0.73) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL6681374 | 1.00 | MAOB (0.73) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL9804016 | 0.88 | MIF (0.67) | MAOBMAOAACHEMIFCYP19A1 | |
| SCHEMBL30298451 | 0.88 | MIF (0.67) | MAOBMAOAACHEMIFCYP19A1 | |
| SCHEMBL1453992 | 0.87 | MAOB (0.67) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL1453994 | 0.87 | MAOB (0.67) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL10134148 | 0.85 | MAOB (0.74) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL14020185 | 0.85 | MAOB (0.74) | MAOBMAOAACHEMIFBCHE | |
| SCHEMBL51712 | 0.85 | MAOB (1.00) | MAOBMAOAACHEMIFBCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240377736-A1 | PHOTOSENSITIVE COMPOSITION | ARKEMA FRANCE (FR) | 2024-11-14 | — | — | US | disclosed |
| CN-118019645-A | Photosensitive composition | 阿科玛法国公司 | 2024-05-10 | — | — | CN | disclosed |
| WO-2023041579-A1 | PHOTOSENSITIVE COMPOSITION | ARKEMA FRANCE (FR) | 2023-03-23 | — | — | WO | disclosed |
| EP-4151410-A1 | PHOTOSENSITIVE COMPOSITION | ARKEMA FRANCE (FR) | 2023-03-22 | — | — | EP | disclosed |
| EP-1546809-B1 | MULTIPHOTON PHOTOSENSITIZATION SYSTEM | 3M INNOVATIVE PROPERTIES CO (US) | 2010-12-15 | — | — | EP | disclosed |
| US-7381516-B2 | Multiphoton photosensitization system | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2008-06-03 | — | — | US | disclosed |
| EP-1552345-B1 | MULTIPHOTON PHOTOSENSITIZATION METHOD | 3M INNOVATIVE PROPERTIES CO (US) | 2007-12-19 | — | — | EP | disclosed |
| US-20070207410-A1 | PLANAR INORGANIC DEVICE | 3M INNOVATIVE PROPERTIES COMPANY | 2007-09-06 | — | — | US | disclosed |
| US-7232650-B2 | Planar inorganic device | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2007-06-19 | — | — | US | disclosed |
| EP-1459132-B1 | MULTIPHOTON PHOTOSENSITIZATION SYSTEM | 3M INNOVATIVE PROPERTIES CO (US) | 2006-06-07 | — | — | EP | disclosed |
| US-20030139484-A1 | Multiphoton photosensitization system | 3M INNOVATIVE PROPERTIES COMPANY | 2003-07-24 | — | — | US | disclosed |
| WO-2003058346-A1 | MULTIPHOTON PHOTOSENSITIZATION SYSTEM | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-07-17 | — | — | WO | disclosed |
| US-5545676-A | CURING MORE RAPIDLY AND DEEPLY UNDER UV OR VISIBLE LIGHT USING AN ARYLIODONIUM SALT, A PHOTOSENSITIZER AND AN ELECTRON DONOR; DENTAL ADHESIVE; PHOTORESISTS; BINDER FOR ABRASIVES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-08-13 | — | — | US | disclosed |
| EP-0465105-B1 | Non-linear optical material and non-linear optical devices | HITACHI CHEMICAL CO LTD (JP) | 1995-03-29 | — | — | EP | disclosed |
| US-5219496-A | NON-LINEAR OPTICAL MATERIAL AND NON-LINEAR OPTICAL DEVICES | HITACHI CHEMICAL COMPANY (JP) | 1993-06-15 | — | — | US | disclosed |
| EP-0465105-A2 | Non-linear optical material and non-linear optical devices | Hitachi Chemical Co., Ltd. (JP) | 1992-01-08 | — | — | EP | disclosed |
| US-4987056-A | IMPROVED SENSITIVITY TO VISIBLE LIGHT | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1991-01-22 | — | — | US | disclosed |
| US-4859551-A | Process for preparing positive and negative images using photohardenable electrostatic master | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-08-22 | — | — | US | disclosed |
| EP-0315121-A2 | Process for preparing positive and negative images using photohardenable electrostatic master | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-05-10 | — | — | EP | disclosed |
| EP-0005274-B1 | PHOTOPOLYMERISABLE COMPOSITIONS COMPRISING DERIVATIVES OF ARYL KETONES AND P-DIALKYLAMINOARYLALDEHYDES AS SENSITISERS FOR VISIBLE LIGHT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-01-18 | — | — | EP | disclosed |