SCHEMBL3814653

SCHEMBL3814653

OCCCN1C=CN(CCO)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3817025 0.93 KDM4E (0.31)
SCHEMBL3817139 0.90 KDM4E (0.32)
SCHEMBL3816759 0.89 AGL (0.30)
SCHEMBL28767408 0.88 USP2 (0.32)
SCHEMBL3818124 0.87 KDM4E (0.33)
Bromide SCHEMBL30913591 0.87
Bromide SCHEMBL30913592 0.87
Water SCHEMBL31507632 0.84 KEAP1 (0.30)
SCHEMBL3813414 0.84 ALDH1A1 (0.42)
SCHEMBL3822874 0.84 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090242414-A1 ELECTRONCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2009-10-01 US claimed
EP-1951934-B1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2009-08-19 EP claimed
US-20080210566-A1 Electrochemical Deposition of Selenium in Ionic Liquids MERCK PATENT GESELLSCHAFT (DE) 2008-09-04 US claimed
EP-1951934-A1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS Merck Patent GmbH (DE) 2008-08-06 EP claimed
CN-101076617-A Electrochemical deposition of tantalum and/or copper in ionic liquids MERCK PATENT GMBH (DE) 2007-11-21 CN claimed
EP-1831433-A2 ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS Merck Patent GmbH (DE) 2007-09-12 EP claimed
WO-2007039035-A1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2007-04-12 WO claimed
WO-2006061081-A2 ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2006-06-15 WO claimed
US-20090242414-A1 ELECTRONCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2009-10-01 US disclosed
EP-1951934-B1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2009-08-19 EP disclosed
US-20080210566-A1 Electrochemical Deposition of Selenium in Ionic Liquids MERCK PATENT GESELLSCHAFT (DE) 2008-09-04 US disclosed
EP-1951934-A1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS Merck Patent GmbH (DE) 2008-08-06 EP disclosed
CN-101076617-A Electrochemical deposition of tantalum and/or copper in ionic liquids MERCK PATENT GMBH (DE) 2007-11-21 CN disclosed
EP-1831433-A2 ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS Merck Patent GmbH (DE) 2007-09-12 EP disclosed
WO-2007039035-A1 ELECTROCHEMICAL DEPOSITION OF SELENIUM IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2007-04-12 WO disclosed
WO-2006061081-A2 ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS MERCK PATENT GMBH (DE) 2006-06-15 WO disclosed