Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRP | O00591 | 2/20 | 0.46 |
| ▸ | GABRD | O14764 | 2/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.46 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.46 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.46 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.46 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.46 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.46 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.46 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.46 |
| ▸ | GABRA4 | P48169 | 2/20 | 0.46 |
| ▸ | GABRE | P78334 | 2/20 | 0.46 |
| ▸ | GABRA6 | Q16445 | 2/20 | 0.46 |
| ▸ | GABRG1 | Q8N1C3 | 2/20 | 0.46 |
| ▸ | GABRG3 | Q99928 | 2/20 | 0.46 |
| ▸ | GABRQ | Q9UN88 | 2/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 3/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.39 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6385659 | 0.88 | AKR1B1 (0.41) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL28052096 | 0.85 | GABRP (0.45) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL28183586 | 0.83 | FFAR3 (0.41) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL11417018 | 0.82 | AKR1B1 (0.45) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL6515414 | 0.80 | AKR1B1 (0.43) | AKR1B1FFAR4FFAR1ALDH1A1TSHR | |
| SCHEMBL14151468 | 0.80 | TET2 (0.31) | TET2TET3GRIK1GRIK2GRM1 | |
| SCHEMBL3453636 | 0.80 | FOLH1 (0.43) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL15606909 | 0.79 | ALDH1A1 (0.43) | ALDH1A1 | |
| SCHEMBL28634074 | 0.79 | FFAR4 (0.53) | AKR1B1FFAR4FFAR1ALDH1A1TSHR | |
| SCHEMBL10134701 | 0.79 | GABRP (0.39) | GABRPGABRDGABRA1GABRB1GABRG2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116338015-B | Detection method of ethyl 4-bromobutyrate related substances | 成都倍特药业股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| EP-1355955-B1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE SRL (IT) | 2009-08-26 | — | — | EP | claimed |
| US-6906154-B2 | Catalyst for the polymerization of olefins | BASELL POLIOLEFINE ITALIA S.P.A. (IT) | 2005-06-14 | — | — | US | claimed |
| EP-1355955-A1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | Basell Poliolefine Italia S.p.A. (IT) | 2003-10-29 | — | — | EP | claimed |
| US-20030027715-A1 | Catalyst for the polymerization of olefins | BASELL POLIOLEFINE ITALIA S.P.A (IT) | 2003-02-06 | — | — | US | claimed |
| WO-2002044219-A1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE ITALIA S.P.A. (IT) | 2002-06-06 | — | — | WO | claimed |
| CN-116381065-A | Method for detecting 4-bromobutyric acid in ethyl 4-bromobutyrate | 成都倍特药业股份有限公司 | 2023-07-04 | — | — | CN | disclosed |
| US-10761426-B2 | Pattern forming method, method for manufacturing electronic device, and laminate | FUJIFILM CORPORATION (JP) | 2020-09-01 | — | — | US | disclosed |
| US-10663864-B2 | Pattern forming method, method for manufacturing electronic device, and laminate | FUJIFILM CORPORATION (JP) | 2020-05-26 | — | — | US | disclosed |
| US-10394127-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20180321589-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-11-08 | — | — | US | disclosed |
| US-20180180996-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180181003-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150168834-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| WO-2014030723-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-02-27 | — | — | WO | disclosed |
| CN-101681755-B | Method for manufacturing plasma display panel | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 2011-08-17 | — | — | CN | disclosed |
| CN-101681755-A | Method for manufacturing plasma display panel | PANASONIC CORP | 2010-03-24 | — | — | CN | disclosed |
| EP-1355955-B1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE SRL (IT) | 2009-08-26 | — | — | EP | disclosed |
| US-6906154-B2 | Catalyst for the polymerization of olefins | BASELL POLIOLEFINE ITALIA S.P.A. (IT) | 2005-06-14 | — | — | US | disclosed |