⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13240598 | 0.80 | GRIN2D (0.39) | — | |
| SCHEMBL2999134 | 0.72 | ALDH1A1 (0.38) | — | |
| SCHEMBL13159747 | 0.70 | MEN1 (0.36) | — | |
| SCHEMBL27709702 | 0.69 | GRIN2D (0.34) | — | |
| SCHEMBL4344337 | 0.69 | GRIN2D (0.44) | — | |
| SCHEMBL10414897 | 0.66 | MEN1 (0.35) | — | |
| SCHEMBL6283357 | 0.65 | — | — | |
| SCHEMBL5644824 | 0.63 | GRIN2D (0.38) | — | |
| SCHEMBL216451 | 0.61 | PKM (0.37) | — | |
| SCHEMBL4436229 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7517634-B2 | Photoresist polymers | JSR CORPORATION (JP) | 2009-04-14 | — | — | US | disclosed |
| US-7510817-B2 | Photoresist polymer compositions | JSR CORPORATION (JP) | 2009-03-31 | — | — | US | disclosed |
| US-7399806-B2 | Synthesis of photoresist polymers | SYMYX TECHNOLOGIES, INC. (US) | 2008-07-15 | — | — | US | disclosed |
| EP-1641848-B1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORP (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-20070185276-A1 | Synthesis of Photresist Polymers | SYMYX TECHNOLOGIES, INC. | 2007-08-09 | — | — | US | disclosed |
| US-7250475-B2 | Free radical addition polymerization of adamantyl (meth)acrylate derivates using a chain transfer agent comprising N-aminodithiocarbamate derivative; patterning semiconductor wafers; lithographic transfer of image from thin film of photosensitive resist material | SYMYX TECHNOLOGIES, INC. (US) | 2007-07-31 | — | — | US | disclosed |
| US-20060257781-A1 | Photoacid generator, and a polymer with units of 2-alkyladamantyl (meth)acrylate, 3-hydroxyadamantyl (meth)acrylate, 1-alkylcyclopentyl (meth)acrylate or 7-oxo-3,8-methano-6-oxabicyclo(3.2.1)octan-4-yl (meth)acrylate, made with a chain transfer agent; e.g. RAFT polymer; narrow polydispersity | FREESLATE, INC. | 2006-11-16 | — | — | US | disclosed |
| US-20060217519-A1 | Photoresist polymers | MIDCAP FINANCIAL TRUST | 2006-09-28 | — | — | US | disclosed |
| US-20060122346-A9 | Synthesis of photoresist polymers | FREESLATE, INC. | 2006-06-08 | — | — | US | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| US-20050059787-A1 | Synthesis of photoresist polymers | SYMYX TECHNOLOGIES, INC. | 2005-03-17 | — | — | US | disclosed |
| WO-2005003192-A1 | SYNTHESIS OF PHOTORESIST POLYMERS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000924-A1 | PHOTORESIST POLYMERS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |