SCHEMBL3842500

SCHEMBL3842500

CC(C)(c1ccc(OS(=O)(=O)C(F)(F)F)cc1)c1ccc(OS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN11 Q06124 1/20 0.50
CA2 P00918 4/20 0.48
CA1 P00915 3/20 0.48
CA9 Q16790 3/20 0.48
CXCR2 P25025 2/20 0.45
KIF11 P52732 1/20 0.44
CXCR1 P25024 1/20 0.44
NR3C2 P08235 3/20 0.41
DRD2 P14416 1/20 0.40
DRD1 P21728 1/20 0.40
DRD4 P21917 1/20 0.40
DRD5 P21918 1/20 0.40
DRD3 P35462 1/20 0.40
HSD11B1 P28845 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HTR1A P08908 1/20 0.37
HTR1D P28221 1/20 0.37
HTR1B P28222 1/20 0.37
ESR1 P03372 1/20 0.37
CYP3A4 P08684 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL869739 0.94 NR3C2 (0.49) PTPN11CA2CA1CA9CXCR2
SCHEMBL16373430 0.94 PTPN11 (0.46) PTPN11CA2CA1CA9CXCR2
SCHEMBL15165487 0.93 CA1 (0.47) PTPN11CA2CA1CA9CXCR2
SCHEMBL9567821 0.91 ESR1 (0.53) PTPN11CA2CA1CA9CXCR2
SCHEMBL16450321 0.88 CA1 (0.43) PTPN11CA2CA1CA9CXCR2
SCHEMBL2832043 0.88 CA1 (0.63) CA2CA1CA9CXCR2KIF11
Hydrogen Sulfide SCHEMBL16581552 0.86 CA1 (0.61) CA2CA1CA9CXCR2KIF11
SCHEMBL576035 0.85 CA2 (0.50) CA2CA1CA9CXCR2KIF11
SCHEMBL1473787 0.85 CA2 (0.46) PTPN11CA2CA1CA9CXCR2
SCHEMBL408478 0.83 CA1 (0.68) CA2CA1CA9CXCR2KIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210309778-A1 HYDROLYSIS-TOLERANT CROSSLINKED POLYMERS FROM REVERSE-ACRYLATE MULTIFUNCTIONAL MONOMERS TDA RESEARCH, INC. 2021-10-07 US disclosed
US-9349961-B2 Organic electroluminescent element material, organic electroluminescent element composition, organic electroluminescent element, display device, and lighting device MITSUBISHI CHEMICAL CORPORATION (JP) 2016-05-24 US disclosed
US-20130200337-A1 ORGANIC ELECTROLUMINESCENT ELEMENT MATERIAL, ORGANIC ELECTROLUMINESCENT ELEMENT COMPOSITION, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY DEVICE, AND LIGHTING DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2013-08-08 US disclosed
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
EP-1188807-B1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORP (JP) 2007-10-17 EP disclosed
EP-1298176-B1 Stacked film insulating film and substrate for semiconductor JSR CORP (JP) 2007-01-03 EP disclosed
US-7153767-B2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2006-12-26 US disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
EP-0956312-B1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORP (JP) 2001-10-10 EP disclosed
US-6300465-B1 Process for producing phenylene-containing polymer and film-forming material JSR CORPORATION (JP) 2001-10-09 US disclosed
EP-0956312-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR Corporation (JP) 1999-11-17 EP disclosed
WO-1998033836-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORPORATION (JP) 1998-08-06 WO disclosed
EP-0557985-A1 Preparation of aromatic polyamides from CO, aromatic diamine and di(trifluoro methane sulfonate) EASTMAN CHEMICAL COMPANY (US) 1993-09-01 EP disclosed
US-5210175-A Catalyst of platinum, palladium or nickel EASTMAN KODAK COMPANY (US) 1993-05-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 PTPN11 2106/4885CA2 4844/4885CA1 4338/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.