⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10774831 | 0.92 | — | — | |
| SCHEMBL14937326 | 0.89 | — | — | |
| SCHEMBL1053813 | 0.72 | — | — | |
| SCHEMBL60817 | 0.70 | — | — | |
| SCHEMBL8790789 | 0.69 | — | — | |
| SCHEMBL1400730 | 0.67 | ALDH1A1 (0.39) | — | |
| SCHEMBL1524546 | 0.67 | — | — | |
| SCHEMBL1400764 | 0.67 | ALDH1A1 (0.44) | — | |
| SCHEMBL11249405 | 0.67 | — | — | |
| SCHEMBL3457327 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 751 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-11340527-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-24 | — | — | US | claimed |
| US-8815339-B2 | Surface modifiers and process for surface modifications of particles of metal oxide using the same | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2014-08-26 | — | — | US | claimed |
| EP-2062948-B1 | Surface modifier for metal oxide particles and method for modifying surface of metal oxide particles using the same | KOREA INST SCI & TECH (KR) | 2013-10-02 | — | — | EP | claimed |
| EP-1096317-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-09-08 | — | — | EP | claimed |
| EP-1422229-B1 | PORPHYRIN-METAL COMPLEXES AND OXYGEN INFUSIONS CONTAINING THE SAME | JAPAN SCIENCE & TECH AGENCY (JP) | 2010-01-13 | — | — | EP | claimed |
| EP-2062948-A2 | Surface modifier for metal oxide particles and method for modifying surface of metal oxide particles using the same | Korea Institute of Science and Technology (KR) | 2009-05-27 | — | — | EP | claimed |
| US-20090130306-A1 | SURFACE MODIFIERS AND PROCESS FOR SURFACE MODIFICATIONS OF PARTICLES OF METAL OXIDE USING THE SAME | KOREA INSTITUTE OF SCIENCE AND TECHNLOGY (KR) | 2009-05-21 | — | — | US | claimed |
| US-20070142290-A1 | SURFACE-MODIFIED SERUM ALBUMIN-METAL PORPHYRIN COMPOSITE, AND OXYGEN INFUSION SOLUTION CONTAINING THE SAME | EISHUN TSUCHIDA (JP) | 2007-06-21 | — | — | US | claimed |
| EP-1792917-A1 | SURFACE-MODIFIED SERUM ALBUMIN-METAL PORPHYRIN COMPOSITE, AND OXYGEN INFUSION CONTAINING THE SAME | Tsuchida, Eishun (JP) | 2007-06-06 | — | — | EP | claimed |
| US-7125862-B2 | Porphyrin-metal complexes and oxygen infusions containing the same | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2006-10-24 | — | — | US | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-20020090572-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES U.S. INC. | 2002-07-11 | — | — | US | claimed |
| US-20020081520-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES INC. (KY) | 2002-06-27 | — | — | US | claimed |
| US-6271331-B1 | BLOCK POLYSILOXANES COPOLYMERS WITH UNSATURATED GROUPS AND SULFIDE OR POLYSULFIDE GROUPS, MASKING GROUPS AND DEHYDROGENATION CATALYSTS | Chimie, Rhodia (FR) | 2001-08-07 | — | — | US | claimed |
| US-6140447-A | ALKOXY FUNCTIONALITY Y INTRODUCED ONTO A HYDROOORGANOSILOXANE BY A DEHYDROGENATION/CONDENSATION REACTION FROM THE ALCOHOL; FUNCTIONALITY W INTRODUCED BY A HYDROSILYLATION REACTION FROM THE OLEFINIC COMPOUND FROM WHICH W DERIVES | RHODIA CHIMIE (FR) | 2000-10-31 | — | — | US | claimed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-3512852-B1 | TRAF 6 INHIBITORS | HELMHOLTZ ZENTRUM MUENCHEN DEUTSCHES FORSCHUNGSZENTRUM GESUNDHEIT & UMWELT GMBH (DE) | 2024-06-26 | — | — | EP | disclosed |
| US-4130652-A | 2-(Iminoethylidene)-pyrrolidines and tautomeric 2-(aminoethenyl)-1-pyrrolines | CIBA-GEIGY CORPORATION (US) | 1978-12-19 | — | — | US | disclosed |
| US-4059629-A | SURFACTANTS | PRODUITS CHIMIQUES UGINE KUHLMANN (FR) | 1977-11-22 | — | — | US | disclosed |