Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL28742442 | 1.00 | — | — | |
| Bromide SCHEMBL9423803 | 1.00 | — | — | |
| Bromide SCHEMBL4945105 | 1.00 | — | — | |
| Bromide SCHEMBL16237278 | 1.00 | — | — | |
| Bromide SCHEMBL140501 | 1.00 | — | — | |
| Bromide SCHEMBL21596248 | 1.00 | — | — | |
| Bromide SCHEMBL27827328 | 1.00 | — | — | |
| Bromide SCHEMBL6685399 | 1.00 | — | — | |
| Bromide SCHEMBL5775102 | 0.82 | — | — | |
| Bromide SCHEMBL3326847 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2112133-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2012-07-04 | — | — | EP | disclosed |
| EP-2112133-A1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR Corporation (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-1245555-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| CN-1379010-A | Halogenated aromatic compound, its polymer, and proton conductive membrane containing same | JSR CORP (JP) | 2002-11-13 | — | — | CN | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1245554-A1 | Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1245555-A1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| EP-0956312-B1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR CORP (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6300465-B1 | Process for producing phenylene-containing polymer and film-forming material | JSR CORPORATION (JP) | 2001-10-09 | — | — | US | disclosed |
| EP-0956312-A1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR Corporation (JP) | 1999-11-17 | — | — | EP | disclosed |
| WO-1998033836-A1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR CORPORATION (JP) | 1998-08-06 | — | — | WO | disclosed |