Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 9/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TP53 | P04637 | 3/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 4/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12904846 | 0.93 | TSHR (0.40) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL275851 | 0.93 | TSHR (0.40) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL30673325 | 0.91 | TSHR (0.43) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL31120303 | 0.87 | ALDH1A1 (0.40) | TSHRHPGDALDH1A1HSD17B10MEN1 | |
| SCHEMBL25688999 | 0.87 | TSHR (0.38) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL2883942 | 0.87 | TSHR (0.43) | TSHRHPGDALDH1A1TP53HIF1A | |
| Ethylene Glycol SCHEMBL21408382 | 0.87 | TSHR (0.38) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL7879723 | 0.86 | TSHR (0.51) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL7087074 | 0.86 | TSHR (0.44) | TSHRHSD17B10MEN1KMT2ACTSK | |
| SCHEMBL24702089 | 0.85 | TSHR (0.39) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1081 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120082236-A | Photo-curing epoxy ink and preparation method and application thereof | 万华化学集团股份有限公司 | 2025-06-03 | — | — | CN | claimed |
| CN-119119922-A | UV high-shear blue film adhesive for insulating and protecting lithium battery core and preparation method thereof | 滁州都铂新材料科技有限公司 | 2024-12-13 | — | — | CN | claimed |
| EP-4263731-B1 | UV CURABLE INKJET INKS AND INKJET PRINTING METHODS | AGFA NV (BE) | 2024-09-18 | — | — | EP | claimed |
| US-20240117207-A1 | UV Curable Inkjet Inks and Inkjet Printing Methods | AGFA NV (BE) | 2024-04-11 | — | — | US | claimed |
| EP-4263731-A1 | UV CURABLE INKJET INKS AND INKJET PRINTING METHODS | AGFA NV (BE) | 2023-10-25 | — | — | EP | claimed |
| CN-111574705-B | Dual-curing nitrate polyether and synthetic method thereof | 西安近代化学研究所 | 2022-10-25 | — | — | CN | claimed |
| WO-2022128258-A1 | UV CURABLE INKJET INKS AND INKJET PRINTING METHODS | AGFA NV (BE) | 2022-06-23 | — | — | WO | claimed |
| CN-111574705-A | Dual-curing nitrate polyether and synthetic method thereof | 西安近代化学研究所 | 2020-08-25 | — | — | CN | claimed |
| US-10672621-B2 | Pattern forming material, pattern forming method, and method for manufacturing semiconductor device | TOSHIBA MEMORY CORPORATION (JP) | 2020-06-02 | — | — | US | claimed |
| EP-3061790-A1 | BIODEGRADABLE POLYESTER RESIN COMPOUND AND FOAM OBTAINED FROM SAME | LOTTE Fine Chemical Co., Ltd. (KR) | 2016-08-31 | — | — | EP | claimed |
| US-20160046824-A1 | HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS | ISP INVESTMENTS INC. (US) | 2016-02-18 | — | — | US | claimed |
| US-8298743-B2 | Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery | FUJIFILM CORPORATION (JP) | 2012-10-30 | — | — | US | claimed |
| US-7825188-B2 | Thermoplastic elastomer with acyloxyphenyl hard block segment | DESIGNER MOLECULES, INC. (US) | 2010-11-02 | — | — | US | claimed |
| US-20100266956-A1 | POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, TRANSPARENT CONDUCTIVE FILM, DISPLAY ELEMENT AND INTEGRATED SOLAR BATTERY | FUJIFILM CORPORATION (JP) | 2010-10-21 | — | — | US | claimed |
| US-7759451-B2 | Fumaric diester copolymer | TOSOH CORPORATION (JP) | 2010-07-20 | — | — | US | claimed |
| US-7670745-B2 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION (JP) | 2010-03-02 | — | — | US | claimed |
| WO-2008077141-A1 | RUBBER EPOXY CURATIVES AND METHODS FOR USE THEREOF | DESIGNER MOLECULES, INC. (US) | 2008-06-26 | — | — | WO | claimed |
| US-20080146738-A1 | RUBBER EPOXY CURATIVES AND METHODS FOR USE THEREOF | DESIGNER MOLECULES, INC. | 2008-06-19 | — | — | US | claimed |
| US-20080131813-A1 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION | 2008-06-05 | — | — | US | claimed |
| US-20070298247-A1 | Fumaric diester copolymer | TOSOH CORPORATION (JP) | 2007-12-27 | — | — | US | claimed |