⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19737269 | 0.79 | ALDH1A1 (1.00) | — | |
| Hydrazobenzene SCHEMBL51179 | 0.79 | ALDH1A1 (1.00) | — | |
| SCHEMBL21764766 | 0.76 | ALDH1A1 (0.79) | — | |
| SCHEMBL13018287 | 0.73 | ALDH1A1 (0.73) | — | |
| SCHEMBL1050432 | 0.73 | — | — | |
| SCHEMBL5854110 | 0.71 | — | — | |
| Hydrazobenzene SCHEMBL29066354 | 0.71 | ALDH1A1 (0.80) | — | |
| SCHEMBL8557531 | 0.69 | — | — | |
| SCHEMBL1470568 | 0.69 | — | — | |
| SCHEMBL21017991 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116355133-B | Modified silicon dioxide-bismaleimide composite material and synthesis process thereof | 广州豫顺新材料有限公司 | 2023-09-15 | — | — | CN | claimed |
| CN-116355133-A | Modified silicon dioxide-bismaleimide composite material and synthesis process thereof | 广州豫顺新材料有限公司 | 2023-06-30 | — | — | CN | claimed |
| CN-116355133-B | Modified silicon dioxide-bismaleimide composite material and synthesis process thereof | 广州豫顺新材料有限公司 | 2023-09-15 | — | — | CN | disclosed |
| CN-116355133-A | Modified silicon dioxide-bismaleimide composite material and synthesis process thereof | 广州豫顺新材料有限公司 | 2023-06-30 | — | — | CN | disclosed |
| EP-1243967-B1 | Photothermographic material, its processing method, and mask material | KONICA CORP (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-1099977-B1 | Preparation method of photothermographic material | KONICA CORP (JP) | 2007-04-11 | — | — | EP | disclosed |
| EP-1058152-B1 | Recovering method of support and useful ingredient from image forming material | KONICA CORP (JP) | 2007-04-11 | — | — | EP | disclosed |
| EP-0990948-B1 | A thermally developable material | KONICA CORP (JP) | 2006-11-29 | — | — | EP | disclosed |
| US-7022471-B2 | Organic silver salt dispersion and production method thereof, photothermographic material and production method thereof | KONICA MINOLTA MEDICAL & GRAPHIC INC. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-6913876-B2 | Photothermographic material | KONICA CORPORATION (JP) | 2005-07-05 | — | — | US | disclosed |
| US-20050048423-A1 | mixing nanostructure particles comprising photostable group IB compounds and photosensitive group IB halides in solvents and binders, to form silver halide emulsions used to form photographic films exhibiting antifogging and high density images | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2005-03-03 | — | — | US | disclosed |
| EP-0600587-A1 | Photothermographic imaging materials and antifoggants therefor | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-06-08 | — | — | EP | disclosed |
| EP-0537975-A1 | Positive-acting photothermographic materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-04-21 | — | — | EP | disclosed |
| US-4433037-A | WITH COBALT AMINE OXIDIZING AGENT AND COMPLEXING AGENT | EASTMAN KODAK COMPANY (US) | 1984-02-21 | — | — | US | disclosed |
| US-4304769-A | PESTICIDES | EASTMAN KODAK COMPANY (US) | 1981-12-08 | — | — | US | disclosed |
| US-4247627-A | Photographic elements having hydrophilic colloid layers containing hydrophobic ultraviolet absorbers uniformly loaded in latex polymer particles | EASTMAN KODAK COMPANY (US) | 1981-01-27 | — | — | US | disclosed |
| US-4214047-A | Photographic elements having hydrophilic colloid layers containing hydrophobic addenda uniformly loaded in latex polymer particles | EASTMAN KODAK COMPANY (US) | 1980-07-22 | — | — | US | disclosed |
| US-4203716-A | Photographic elements having hydrophilic colloid layers containing hydrophobic addenda uniformly loaded in latex polymer particles | EASTMAN KODAK COMPANY (US) | 1980-05-20 | — | — | US | disclosed |
| US-4199363-A | Processes for achieving uniform, efficient distribution of hydrophobic materials through hydrophilic colloid layers and loaded latex compositions | EASTMAN KODAK COMPANY (US) | 1980-04-22 | — | — | US | disclosed |
| US-4133687-A | Photographic elements having hydrophilic colloid layers containing compounds having activator precursors and hydrophobic developing agents uniformly loaded in latex polymer particles | EASTMAN KODAK COMPANY (US) | 1979-01-09 | — | — | US | disclosed |