SCHEMBL8557531

SCHEMBL8557531

ONNc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrazobenzene SCHEMBL51179 0.79 ALDH1A1 (1.00)
SCHEMBL19737269 0.79 ALDH1A1 (1.00)
SCHEMBL28504196 0.77 ALDH1A1 (0.67)
SCHEMBL21764766 0.76 ALDH1A1 (0.79)
SCHEMBL28622340 0.75 ALDH1A1 (0.50)
SCHEMBL28537761 0.75 ALDH1A1 (0.48)
SCHEMBL3635635 0.75 GAA (0.55)
SCHEMBL2885482 0.75 GAA (0.67)
SCHEMBL13434772 0.75 ALDH1A1 (0.69)
SCHEMBL294587 0.75 TSHR (0.67)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108883069-A Esterification/saponification based process for micro-lipid loading 中央研究院 2018-11-23 CN claimed
CN-1308094-A Polymer mixture and its preparation, photosensitive composite and pattern preparing method TOYO COSEI KOGYO CO LTD (JP) 2001-08-15 CN claimed
WO-2023095047-A1 METHOD FOR CLEANING COMPONENTS PRODUCED BY LITHOGRAPHIC ADDITIVE MANUFACTURING CUBICURE GMBH (AT) 2023-06-01 WO disclosed
CN-108883069-A Esterification/saponification based process for micro-lipid loading 中央研究院 2018-11-23 CN disclosed
US-20150235777-A1 POWER STORAGE DEVICE POSITIVE ELECTRODE, POWER STORAGE DEVICE, AND METHOD FOR PRODUCING SLURRY FOR POWER STORAGE DEVICE POSITIVE ELECTRODE NITTO DENKO CORPORATION (JP) 2015-08-20 US disclosed
CN-104080788-A Novel compound, photosensitive composition and photosensitizer containing the same LG CHEMICAL LTD 2014-10-01 CN disclosed
EP-2748209-A1 METHOD FOR REDUCING THE HALOGEN CONTENT OF A POLYMER Evonik Oil Additives GmbH (DE) 2014-07-02 EP disclosed
CN-101998947-B Urethane multifunctional monomer, method for preparing the same, and photosensitive resin composition containing the same LG CHEMICAL LTD 2014-05-14 CN disclosed
CN-103649462-A Sampling procedure for polymer-based solutions used in underground formations SPCM SA 2014-03-19 CN disclosed
CN-103476808-A Dye-containing polymer compound and cured resin composition containing the same LG CHEMICAL LTD 2013-12-25 CN disclosed
WO-2013029837-A1 METHOD FOR REDUCING THE HALOGEN CONTENT OF A POLYMER EVONIK ROHMAX ADDITIVES GMBH (DE) 2013-03-07 WO disclosed
US-5445943-A Reduction of an aromatic nitrosoaniline compound to a colored quinone diimine BOEHRINGER MANNHEIM GMBH (DE) 1995-08-29 US disclosed
US-5399709-A N-substituted triarylmethane sulfonamides and method of preparation POLAROID CORPORATION (US) 1995-03-21 US disclosed
US-5332654-A Sulfonamide triarylmethane dye POLAROID CORPORATION (US) 1994-07-26 US disclosed
US-5258279-A IMAGE RECORDING MEDIA POLAROID CORPORATION (US) 1993-11-02 US disclosed
EP-0516163-A1 Reversible redox-controlled imaging methods POLAROID CORPORATION (US) 1992-12-02 EP disclosed
EP-0144766-B1 REACTIVE DYES, THEIR PREPARATION AND THEIR USE CIBA-GEIGY AG (CH) 1988-10-05 EP disclosed
EP-0159292-B1 REACTIVE DYES, THEIR PREPARATION AND THEIR USE CIBA-GEIGY AG (CH) 1988-01-07 EP disclosed
EP-0159292-A2 Reactive dyes, their preparation and their use CIBA-GEIGY AG (CH) 1985-10-23 EP disclosed
EP-0144766-A2 Reactive dyes, their preparation and their use CIBA-GEIGY AG (CH) 1985-06-19 EP disclosed