⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1466199 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL304891 | 0.77 | CXCR2 (0.54) | — | |
| SCHEMBL11648181 | 0.77 | NPC1 (0.53) | — | |
| SCHEMBL4406660 | 0.74 | — | — | |
| SCHEMBL1920752 | 0.74 | CXCR2 (0.52) | — | |
| SCHEMBL297418 | 0.72 | — | — | |
| SCHEMBL1943622 | 0.72 | — | — | |
| SCHEMBL1488039 | 0.72 | — | — | |
| SCHEMBL457878 | 0.72 | — | — | |
| SCHEMBL3191936 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1243967-B1 | Photothermographic material, its processing method, and mask material | KONICA CORP (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-1099977-B1 | Preparation method of photothermographic material | KONICA CORP (JP) | 2007-04-11 | — | — | EP | disclosed |
| EP-1058152-B1 | Recovering method of support and useful ingredient from image forming material | KONICA CORP (JP) | 2007-04-11 | — | — | EP | disclosed |
| EP-0990948-B1 | A thermally developable material | KONICA CORP (JP) | 2006-11-29 | — | — | EP | disclosed |
| US-6913876-B2 | Photothermographic material | KONICA CORPORATION (JP) | 2005-07-05 | — | — | US | disclosed |
| EP-0996032-B1 | A thermally developable material | KONISHIROKU PHOTO IND (JP) | 2005-01-26 | — | — | EP | disclosed |
| EP-1035430-B1 | Silver halide photographic material | KONISHIROKU PHOTO IND (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-6828086-B2 | For use in imaging material | KONICA CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| EP-0933672-B1 | Processing method of thermally developable photosensitive material | KONISHIROKU PHOTO IND (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040033453-A1 | Photothermographic material | KONICA CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| EP-0952481-A1 | Thermally developable photosensitive material | KONICA CORPORATION (JP) | 1999-10-27 | — | — | EP | disclosed |
| EP-0952482-A1 | Thermally developable material | KONICA CORPORATION (JP) | 1999-10-27 | — | — | EP | disclosed |
| EP-0950921-A2 | Thermally processable photosensitive material, image forming method and antifoggant | KONICA CORPORATION (JP) | 1999-10-20 | — | — | EP | disclosed |
| EP-0949537-A2 | Thermally developable photosensitive material | KONICA CORPORATION (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0933672-A1 | Processing method of thermally developable photosensitive material | KONICA CORPORATION (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0933673-A1 | X-ray image forming method and x-ray image forming system | KONICA CORPORATION (JP) | 1999-08-04 | — | — | EP | disclosed |
| US-5925777-A | PREVENT FADING OF INFORMATION RECORDING MATERIALS | FUJI PHOTO FILM CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5698380-A | SUBJECTING A LIGHT SENSITIVE MATERIAL TO EXPOSURE TO LASER LIGHT | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0803781-A1 | Image recording method and apparatus | Fuji Photo Film Co., Ltd. (JP) | 1997-10-29 | — | — | EP | disclosed |
| EP-0802178-A2 | Schiff base quinone complexes and optical recording materials comprising the same | Fuji Photo Film Co., Ltd. (JP) | 1997-10-22 | — | — | EP | disclosed |