SCHEMBL3856722

SCHEMBL3856722

CCOC(=O)C(C)O.COCC(C)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.40
MAPT P10636 1/20 0.39
ALDH1A1 P00352 5/20 0.37
LMNA P02545 1/20 0.36
ALOX15 P16050 3/20 0.34
MGAM O43451 1/20 0.34
GAA P10253 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
SOAT1 P35610 1/20 0.34
TDP1 Q9NUW8 2/20 0.34
TRPA1 O75762 1/20 0.32
MAPK1 P28482 1/20 0.32
CYP3A4 P08684 2/20 0.32
TSHR P16473 1/20 0.32
METAP2 P50579 1/20 0.31
METAP1 P53582 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
CHRM1 P11229 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28085603 0.85 MAPT (0.41) HSD17B10MAPTALDH1A1TDP1TSHR
SCHEMBL471892 0.84 ALDH1A1 (0.50) HSD17B10ALDH1A1LMNAALOX15MGAM
SCHEMBL29615225 0.84
SCHEMBL344175 0.84
SCHEMBL22598 0.84
SCHEMBL284806 0.84
SCHEMBL4591693 0.83 HSD17B10 (0.45) HSD17B10MAPTALDH1A1LMNAALOX15
Ethyl Acetate SCHEMBL1744775 0.83 ALDH1A1 (0.58) HSD17B10MAPTALDH1A1LMNAALOX15
SCHEMBL20491931 0.82 HSD17B10 (0.67) HSD17B10MAPTALDH1A1LMNAALOX15
Methoxymethane SCHEMBL3474928 0.82 ALDH1A1 (0.46) HSD17B10MAPTALDH1A1LMNAALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7582412-B2 Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-09-01 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
CN-1775861-A Composition and method ROHM & HAAS ELECT MAT (US) 2006-05-24 CN disclosed
US-20040265754-A1 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. 2004-12-30 US disclosed
EP-1422566-A1 Multilayer photoresist systems Shipley Company, L.L.C. (US) 2004-05-26 EP disclosed
EP-1422565-A2 Multilayer photoresist systems Shipley Company LLC (US) 2004-05-26 EP disclosed