SCHEMBL3869199

SCHEMBL3869199

Cc1cc(O)ccc1N1C(=O)C=CC1=O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.62
ESR2 Q92731 2/20 0.62
MGLL Q99685 7/20 0.55
HSP90AA1 P07900 5/20 0.48
TDP1 Q9NUW8 4/20 0.48
PKM P14618 3/20 0.48
NPSR1 Q6W5P4 3/20 0.48
MAPK1 P28482 1/20 0.48
TLR9 Q9NR96 2/20 0.43
HPGD P15428 3/20 0.42
CCR6 P51684 3/20 0.42
G6PD P11413 2/20 0.42
ALDH1A1 P00352 2/20 0.42
HTT P42858 2/20 0.42
MAPT P10636 1/20 0.42
NLRP1 Q9C000 1/20 0.42
POLB P06746 1/20 0.42
TP53 P04637 1/20 0.42
ANPEP P15144 1/20 0.40
DPP4 P27487 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30474623 1.00 ESR1 (0.62) ESR1ESR2MGLLHSP90AA1TDP1
SCHEMBL3183796 0.80 HPGD (0.63) ESR1ESR2MGLLHSP90AA1TDP1
SCHEMBL30104193 0.80 HPGD (0.63) ESR1ESR2MGLLHSP90AA1TDP1
SCHEMBL29485049 0.80 MGLL (0.59) MGLLHSP90AA1TDP1PKMNPSR1
SCHEMBL717739 0.80 MGLL (0.59) MGLLHSP90AA1TDP1PKMNPSR1
SCHEMBL1741609 0.78 TLR9 (0.61) MGLLHSP90AA1TDP1PKMNPSR1
SCHEMBL29898506 0.78 TLR9 (0.61) MGLLHSP90AA1TDP1PKMNPSR1
SCHEMBL30474621 0.78 MGLL (0.59) ESR1ESR2MGLLHSP90AA1TDP1
SCHEMBL9838914 0.78 MGLL (0.59) ESR1ESR2MGLLHSP90AA1TDP1
SCHEMBL19371511 0.77 MGLL (0.55) ESR1ESR2MGLLHSP90AA1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116217788-A Anti-solvent vinyl polymer and synthetic method and application thereof 乐凯华光印刷科技有限公司 2023-06-06 CN disclosed
US-10106683-B2 Resin composite, semiconductor device, and method of manufacturing the semiconductor device FUJI ELECTRIC CO., LTD. (JP) 2018-10-23 US disclosed
US-9870972-B2 Thermosetting resin molded article FUJI ELECTRIC CO., LTD. (JP) 2018-01-16 US disclosed
US-20170240744-A1 RESIN COMPOSITE, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE FUJI ELECTRIC CO., LTD. (JP) 2017-08-24 US disclosed
US-20170047263-A1 THERMOSETTING RESIN MOLDED ARTICLE FUJI ELECTRIC CO., LTD. (JP) 2017-02-16 US disclosed
CN-103717634-B For semiconductor packages composition epoxy resin, use its semiconductor device and the method being used for producing the semiconductor devices 纳美仕有限公司 2016-11-23 CN disclosed
CN-104010815-A Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate TAIYO INK MFG CO LTD 2014-08-27 CN disclosed
CN-103717634-A Epoxy resin composition for semiconductor encapsulation, semiconductor device using the same, and method for producing semiconductor device NAMICS CORP 2014-04-09 CN disclosed
CN-102369482-B Curable resin composition and printed wiring board TAIYO INK MFG CO LTD 2013-07-17 CN disclosed
WO-2013018847-A1 EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION, SEMICONDUCTOR DEVICE USING THE SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE NAMICS CORPORATION (JP) 2013-02-07 WO disclosed
US-20060216436-A1 WIDE-VIEWING ANGLE COMPENSATION FILM AND TRANSMISSION TYPE LIQUID-CRYSTAL DISPLAY EMPLOYING THE SAME TOSOH CORPORATION (JP) 2006-09-28 US disclosed
US-7001967-B2 Resin with excellent heat resistance and dynamic characteristics, having negative birefringence and exhibiting a high refractive index and a high Abbe number, especially optical compensating members such as films, sheets and TOSOH CORPORATION (JP) 2006-02-21 US disclosed
US-20040063887-A1 Transparent heat-resistant resin optical material and film TOSOH CORPORATION (JP) 2004-04-01 US disclosed
EP-1403297-A1 Transparent heat-resistant resin optical material and film Tosoh Corporation (JP) 2004-03-31 EP disclosed
US-5075453-A Process for producing aryloxy-substituted phosphazene derivatives NIPPON SODA CO., LTD. (JP) 1991-12-24 US disclosed
US-4855389-A Process for producing phosphonitrile oligomers containing maleimidophenoxy group SHIN NISSO KAKO CO., LTD. (JP) 1989-08-08 US disclosed
US-4816523-A LIGHT SENSITIVE ELEMENTS UBE INDUSTRIES, LTD. (JP) 1989-03-28 US disclosed
US-4740561-A MALEIC ANHYDRIDE UNSATURATED HYDROCARBON COPOLYMER REACTED WITH AMINOPHENOL UBE INDUSTRIES, LTD. (JP) 1988-04-26 US disclosed
US-4289699-A DISSOLVING CORRESPONSING ESTER IN OXYACID, HYDROLYSIS, PRECIPITATION MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1981-09-15 US disclosed
US-4231934-A TREATING A N-(HYDROXYPHENYL)MALEAMIC ACID WITH A DEHYDRATING AGENT MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1980-11-04 US disclosed