Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3874080 | 0.98 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL3871057 | 0.95 | ALDH1A1 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL11589592 | 0.90 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1 | |
| SCHEMBL21136020 | 0.78 | CA1 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL14946655 | 0.78 | — | — | |
| SCHEMBL3870030 | 0.76 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1 | |
| SCHEMBL21135703 | 0.76 | PDK1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL3873350 | 0.75 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL21135960 | 0.75 | PDK1 (0.35) | ALDH1A1L3MBTL1 | |
| SCHEMBL21136041 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200209743-A1 | COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME | ROHM & HAAS ELECT MAT (US) | 2020-07-02 | — | — | US | disclosed |
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20080187859-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| US-7288359-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-10-30 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |