SCHEMBL3870948

SCHEMBL3870948

O=S(=O)(O)C(F)(F)Cc1cc(F)ccc1F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 1/20 0.44
PSEN2 P49810 1/20 0.44
APH1B Q8WW43 1/20 0.44
NCSTN Q92542 1/20 0.44
APH1A Q96BI3 1/20 0.44
PSENEN Q9NZ42 1/20 0.44
RIPK1 Q13546 1/20 0.40
PTPN1 P18031 2/20 0.36
CES2 O00748 2/20 0.36
CES1 P23141 2/20 0.36
CA3 P07451 1/20 0.35
CA6 P23280 1/20 0.35
CA5A P35218 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
DPP4 P27487 4/20 0.35
DPP7 Q9UHL4 3/20 0.35
DPP8 Q6V1X1 1/20 0.35
DPP9 Q86TI2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3870719 0.86 IDO1 (0.41) RIPK1PTPN1CES2CES1
SCHEMBL3869667 0.74 HTT (0.39) RIPK1PTPN1CES2CES1MAPK8
SCHEMBL3870573 0.72 RIPK1 (0.39) RIPK1PTPN1CES2CES1KMT2A
SCHEMBL3869690 0.71 IDO1 (0.33) PTPN1CES2CES1CA9
SCHEMBL28970933 0.71 RIPK1 (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL18408696 0.70
SCHEMBL4404016 0.70 RIPK1 (0.46) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3877025 0.69 PTPN1 (0.36) PTPN1CES2CES1RORCKMT2A
SCHEMBL3870243 0.69 PTPN1 (0.46) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL28064177 0.68 PSEN1 (0.43) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed