SCHEMBL3871344

SCHEMBL3871344

C=C(C)C(=O)OC(C)OC1CCC(OC(C)OC(=O)C(=C)C)CC1

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
ALDH1A1 P00352 2/20 0.37
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4245638 0.93 TSHR (0.36) TSHRALDH1A1
SCHEMBL631827 0.91 TSHR (0.35) TSHRALDH1A1
SCHEMBL8772401 0.81
SCHEMBL25475962 0.80 TSHR (0.35) TSHRALDH1A1
SCHEMBL3390332 0.79 TSHR (0.44) TSHR
SCHEMBL2392846 0.79 ALDH1A1 (0.38) TSHRALDH1A1
SCHEMBL6850379 0.79 ALDH1A1 (0.36) TSHRALDH1A1
SCHEMBL538063 0.79 TSHR (0.50) TSHRALDH1A1THRB
SCHEMBL25475963 0.78 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL92238 0.77 IDO1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20230152697-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-18 US disclosed
US-20230152697-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-18 US disclosed
US-20130196144-A1 Laser Engraveable Compositions for Relief Image Printing Elements NAPP SYSTEMS, INC. 2013-08-01 US disclosed
US-7625959-B2 Curable jettable liquid for flexography AGFA GRAPHICS, N.V. (BE) 2009-12-01 US disclosed
EP-1637322-B1 Method for manufacturing a flexographic printing master AGFA GRAPHICS NV (BE) 2009-05-13 EP disclosed
EP-1637926-B1 Curable jettable liquid for the production of a flexographic printing plate AGFA GRAPHICS NV (BE) 2009-04-22 EP disclosed
US-7401552-B2 Method for manufacturing a flexographic printing master AGFA GRAPHICS N.V. (BE) 2008-07-22 US disclosed
US-20060073417-A1 Photopolymer plate and method for imaging the surface of a photopolymer plate HERMESDORF MARK 2006-04-06 US disclosed
EP-0741045-B1 Printing medium, production process thereof and image-forming process using the medium CANON KK (JP) 1999-10-27 EP disclosed
US-5965252-A SUBSTRATE AND INK-RECEIVING LAYER COMPRISING ALUMINA HYDRATE SURFACE TREATED WITH A COUPLING AGENT TO MAKE IT MORE HYDROPHOBIC; FOR WATER BASED INKS; PREVENTS BEADING, PROVIDES IMAGES HIGH IN OPTICAL DENSITY, SURFACE HARDNESS CANON KABUSHIKI KAISHA (JP) 1999-10-12 US disclosed
US-5663032-A NAPHTHOL DERIVATIVE REDUCING AGENT CANON KABUSHIKI KAISHA (JP) 1997-09-02 US disclosed
EP-0741045-A1 Printing medium, production process thereof and image-forming process using the medium CANON KABUSHIKI KAISHA (JP) 1996-11-06 EP disclosed
EP-0360014-B1 Photosensitive material and image forming method using same CANON KK (JP) 1996-01-03 EP disclosed
EP-0653680-A2 Photosensitive composition, photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1995-05-17 EP disclosed
US-5415974-A Silver halide, organic silver salt, polymerizable compound, heat-diffusing dye CANON KABUSHIKI KAISHA (JP) 1995-05-16 US disclosed
EP-0353030-B1 Photopolymerization initiator and photosensitive composition employing the same CANON KK (JP) 1995-03-15 EP disclosed
US-5124235-A Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1992-06-23 US disclosed
EP-0353030-A2 Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1990-01-31 EP disclosed