Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | SCN1A | P35498 | 1/20 | 0.30 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.30 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4245638 | 0.98 | TSHR (0.36) | TSHRALDH1A1 | |
| SCHEMBL3871344 | 0.91 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL8982919 | 0.82 | — | — | |
| SCHEMBL2739849 | 0.82 | TSHR (0.39) | TSHRCYP19A1EPHX1LMNACYP1A2 | |
| SCHEMBL12190126 | 0.81 | CYP19A1 (0.32) | CYP19A1ACHE | |
| SCHEMBL16866420 | 0.80 | EPHX1 (0.32) | TSHRALDH1A1EPHX1 | |
| SCHEMBL2739859 | 0.80 | TSHR (0.41) | TSHRCYP19A1EPHX1LMNACYP1A2 | |
| SCHEMBL16706530 | 0.79 | ALDH1A1 (0.31) | ALDH1A1CYP19A1 | |
| SCHEMBL9002290 | 0.78 | EPHX1 (0.38) | TSHRALDH1A1CYP19A1EPHX1 | |
| SCHEMBL2958767 | 0.77 | TSHR (0.36) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6617086-B2 | Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-09-09 | — | — | US | claimed |
| US-20020123010-A1 | Forming a pattern of a negative photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-05 | — | — | US | claimed |
| US-6251569-B1 | ACRYLATED ESTER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | claimed |
| US-12421339-B2 | (Meth)acrylic copolymer, pressure-sensitive adhesive composition, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| US-20250206861-A1 | COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM, AND ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| US-12264212-B2 | Copolymer for suppressing protein adsorption, method for producing copolymer, resin modifier, molding material, copolymer-containing composition, coating film, and article | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| EP-3858879-B1 | COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE | MITSUBISHI CHEM CORP (JP) | 2025-01-01 | — | — | EP | disclosed |
| US-20240301193-A1 | RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, MOLDING MATERIAL, AND ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| EP-4421120-A1 | RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, MOLDING MATERIAL AND ARTICLE | Mitsubishi Chemical Corporation (JP) | 2024-08-28 | — | — | EP | disclosed |
| CN-118159603-A | Resin composition, method for producing resin composition, molding material, and article | 三菱化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-1898291-A | Curable resin composition, overcoats, and process for formation thereof | JSR CORP (JP) | 2007-01-17 | — | — | CN | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| CN-1749856-A | Curable jettable liquid for flexography | AGFA GEVAERT (BE) | 2006-03-22 | — | — | CN | disclosed |
| CN-1749858-A | Method for manufacturing a flexographic printing master | AGFA GEVAERT (BE) | 2006-03-22 | — | — | CN | disclosed |
| US-6617086-B2 | Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-09-09 | — | — | US | disclosed |
| US-20020123010-A1 | Forming a pattern of a negative photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-05 | — | — | US | disclosed |
| US-6251569-B1 | ACRYLATED ESTER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | disclosed |
| US-5994025-A | MIXTURE OF POLYMER AND ACID GENERATOR | NEC CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |