Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 2/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10867032 | 0.76 | — | — | |
| SCHEMBL2837642 | 0.74 | LMNA (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3873892 | 0.74 | — | — | |
| Water SCHEMBL28240550 | 0.68 | GRIN2D (0.42) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Phosphine SCHEMBL25171299 | 0.67 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3334426 | 0.67 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL498011 | 0.67 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Water SCHEMBL1798080 | 0.67 | GRIN2D (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL678264 | 0.65 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL5707247 | 0.65 | MAPT (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |