Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 3/20 | 0.33 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.33 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.33 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.33 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.33 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.33 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.32 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.32 |
| ▸ | STAT6 | P42226 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28714219 | 0.83 | THRB (0.38) | LMNACYP2C9THRB | |
| SCHEMBL3843092 | 0.74 | GRIN2D (0.35) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3334426 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL498011 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL546127 | 0.72 | CYP2C9 (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Phosphine SCHEMBL25171299 | 0.72 | SLC22A2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4607135 | 0.72 | PKM (0.39) | — | |
| SCHEMBL4027682 | 0.70 | PKM (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4329163 | 0.70 | LMNA (0.32) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1015951 | 0.70 | GRIN2D (0.38) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-114560768-A | Synthesis method of acrylate resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2022-05-31 | — | — | CN | claimed |
| EP-2272825-B1 | Protected amino hydroxy adamantane carboxylic acid and process for its preparation | ASTRAZENECA AB (SE) | 2015-11-04 | — | — | EP | claimed |
| US-12122755-B2 | Methods for producing nitroso compound and quinoxaline compound | KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) | 2024-10-22 | — | — | US | disclosed |
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-117623918-A | Preparation method of acrylic resin monomer for 193nm photoresist | 河北凯力昂生物科技有限公司 | 2024-03-01 | — | — | CN | disclosed |
| EP-3795558-B1 | PRODUCTION METHODS FOR NITROSO COMPOUND AND QUINOXALINE COMPOUND | KUMIAI CHEMICAL INDUSTRY CO (JP) | 2023-11-22 | — | — | EP | disclosed |
| CN-113227041-B | Process for producing nitroso compound and quinoxaline compound | 组合化学工业株式会社 | 2023-03-24 | — | — | CN | disclosed |
| US-20230074836-A1 | Methods for Producing Nitroso Compound and Quinoxaline Compound | KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) | 2023-03-09 | — | — | US | disclosed |
| US-11492334-B2 | Methods for producing nitroso compound and quinoxaline compound | KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) | 2022-11-08 | — | — | US | disclosed |
| CN-114560768-A | Synthesis method of acrylate resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2022-05-31 | — | — | CN | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-20050266351-A1 | Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-12-01 | — | — | US | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11492334-B2 | Methods for producing nitroso compound and quinoxaline compound | CBR3, NQO2, ADH1C | GRIN2D 2836/4885GRIN3B 2237/4885GRIN1 2608/4885 |
| US-20230074836-A1 | Methods for Producing Nitroso Compound and Quinoxaline Compound | ADH1C, NOXO1, NOX1 | GRIN2D 2013/4885GRIN3B 1991/4885GRIN1 1573/4885 |
| US-12122755-B2 | Methods for producing nitroso compound and quinoxaline compound | ADH1C, NOXO1, NOX1 | GRIN2D 2013/4885GRIN3B 1991/4885GRIN1 1573/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.