Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | PPARA | Q07869 | 3/20 | 0.45 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.45 |
| ▸ | DRD3 | P35462 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | LTB4R | Q15722 | 3/20 | 0.43 |
| ▸ | CASP6 | P55212 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2492898 | 0.84 | TSHR (0.68) | CNR2ALDH1A1TSHRLMNAKDM4E | |
| SCHEMBL4632462 | 0.82 | CA12 (0.49) | ALDH1A1KDM4ETDP1L3MBTL1HSD17B10 | |
| SCHEMBL4633422 | 0.82 | CA12 (0.49) | ALDH1A1KDM4ETDP1L3MBTL1HSD17B10 | |
| SCHEMBL9731268 | 0.82 | CA12 (0.49) | ALDH1A1KDM4ETDP1L3MBTL1HSD17B10 | |
| SCHEMBL1164310 | 0.82 | TSHR (0.67) | CNR2ALDH1A1TSHRLMNAKDM4E | |
| SCHEMBL5162430 | 0.81 | TSHR (0.66) | CNR2ALDH1A1TSHRLMNAKDM4E | |
| SCHEMBL29043958 | 0.80 | ALDH1A1 (0.54) | ALDH1A1TSHRLMNAKDM4EGAA | |
| SCHEMBL6385566 | 0.80 | CNR2 (0.57) | CNR2ALDH1A1KDM4EPPARATDP1 | |
| Anthracene SCHEMBL28084287 | 0.79 | ALDH1A1 (0.63) | ALDH1A1TSHRLMNAKDM4ECYP3A4 | |
| SCHEMBL22712398 | 0.79 | ALDH1A1 (0.57) | ALDH1A1TSHRKDM4EGAACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100564463-C | Liquid ink and recording apparatus | TOSHIBA TEC K K TOSHIBA KK (JP) | 2009-12-02 | — | — | CN | disclosed |
| US-7500745-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-03-10 | — | — | US | disclosed |
| US-7387380-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-06-17 | — | — | US | disclosed |
| CN-100361815-C | Ink jet recording apparatus | TOSHIBA TEC KK (JP) | 2008-01-16 | — | — | CN | disclosed |
| US-20060274135-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2006-12-07 | — | — | US | disclosed |
| US-20060274136-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2006-12-07 | — | — | US | disclosed |
| US-7125112-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2006-10-24 | — | — | US | disclosed |
| US-7108367-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2006-09-19 | — | — | US | disclosed |
| CN-1689810-A | Ink jet recording apparatus | TOSHIBA TEC KK (JP) | 2005-11-02 | — | — | CN | disclosed |
| US-6959986-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2005-11-01 | — | — | US | disclosed |
| US-20050168556-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050168553-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20030231234-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2003-12-18 | — | — | US | disclosed |
| CN-1453317-A | Liquid ink and recording apparatus | TOSHIBA TEC KK (JP) | 2003-11-05 | — | — | CN | disclosed |
| EP-1357159-A2 | Liquid ink and recording apparatus | Toshiba Tec Kabushiki Kaisha (JP) | 2003-10-29 | — | — | EP | disclosed |
| US-RE38256-E1 | Safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-09-23 | — | — | US | disclosed |
| US-6168897-B1 | PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-01-02 | — | — | US | disclosed |
| US-5928841-A | Method of photoetching at 180 to 220 | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5691101-A | NONTOXIC PHOTORESISTS FOR MANUFACTURE OF CATHODE RAY TUBES AND IMAGE PICKUP DEVICES, ACID GENERATING COMPOUND WHICH CATALYZES CROSSLINKING OR DECOMPOSITION OF RESIN | KABUSHIKI KAISHA TOSHIBA (JP) | 1997-11-25 | — | — | US | disclosed |