SCHEMBL3889129

SCHEMBL3889129

CCOCCCC(C)(C)C(=O)O[SiH3]

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 3/20 0.47
CYP4A11 Q02928 3/20 0.47
ALDH1A1 P00352 2/20 0.35
TSHR P16473 2/20 0.35
THRB P10828 2/20 0.33
PKM P14618 1/20 0.33
HTT P42858 2/20 0.32
ACLY P53396 1/20 0.32
PPARA Q07869 1/20 0.31
ACACB O00763 1/20 0.31
ACACA Q13085 1/20 0.31
HPGD P15428 2/20 0.30
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
CES2 O00748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3890829 0.87 CYP4F2 (0.42) CYP4F2CYP4A11TSHRACLYPPARA
SCHEMBL3901988 0.81 CYP4F2 (0.42) CYP4F2CYP4A11ALDH1A1TSHRACLY
SCHEMBL6291594 0.80 CYP4F2 (0.48) CYP4F2CYP4A11TSHRCES2
SCHEMBL5832204 0.80 CYP4F2 (0.36) CYP4F2CYP4A11CES2
SCHEMBL7055141 0.79 CYP4F2 (0.52) CYP4F2CYP4A11TSHRCES2
SCHEMBL18496504 0.79 CYP4F2 (0.52) CYP4F2CYP4A11TSHRCES2
SCHEMBL7057733 0.79 CYP4F2 (0.52) CYP4F2CYP4A11TSHRCES2
SCHEMBL7057707 0.79 CYP4F2 (0.52) CYP4F2CYP4A11TSHRCES2
SCHEMBL11259983 0.79 PPARA (0.47) CYP4F2CYP4A11ALDH1A1TSHRACLY
SCHEMBL11075905 0.78 ALDH1A1 (0.45) CYP4F2CYP4A11ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed