SCHEMBL3901988

SCHEMBL3901988

COCCCC(C)(C)C(=O)O[SiH3]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.42
CYP4A11 Q02928 2/20 0.42
ARG1 P05089 1/20 0.40
ARG2 P78540 1/20 0.40
ALDH1A1 P00352 2/20 0.36
TSHR P16473 2/20 0.33
ACLY P53396 1/20 0.33
PPARA Q07869 6/20 0.33
ACACB O00763 1/20 0.32
ACACA Q13085 1/20 0.32
TTR P02766 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C8 P10632 1/20 0.31
CHRM1 P11229 1/20 0.31
CYP2C9 P11712 1/20 0.31
ADRA1A P35348 1/20 0.31
PPARG P37231 1/20 0.31
HTR2B P41595 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
SLCO1B3 Q9NPD5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13355267 0.83 CYP4F2 (0.40) CYP4F2CYP4A11ARG1ARG2ALDH1A1
SCHEMBL7947550 0.82 CYP4F2 (0.43) CYP4F2CYP4A11ARG1ARG2ALDH1A1
SCHEMBL11075905 0.81 ALDH1A1 (0.45) CYP4F2CYP4A11ALDH1A1TSHRACLY
SCHEMBL3889129 0.81 CYP4F2 (0.47) CYP4F2CYP4A11ALDH1A1TSHRACLY
SCHEMBL3890829 0.79 CYP4F2 (0.42) CYP4F2CYP4A11TSHRACLYPPARA
SCHEMBL6291594 0.79 CYP4F2 (0.48) CYP4F2CYP4A11TSHR
SCHEMBL13039859 0.78 CYP4F2 (0.44) CYP4F2CYP4A11ARG1ARG2ALDH1A1
SCHEMBL7057707 0.78 CYP4F2 (0.52) CYP4F2CYP4A11TSHR
SCHEMBL7057733 0.78 CYP4F2 (0.52) CYP4F2CYP4A11TSHR
SCHEMBL7055141 0.78 CYP4F2 (0.52) CYP4F2CYP4A11TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed