SCHEMBL3890200

SCHEMBL3890200

CCN(CC)c1ccc(C(C)c2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 9/20 0.52
CNR1 P21554 2/20 0.48
ALDH1A1 P00352 4/20 0.47
TSHR P16473 3/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
NPC1 O15118 1/20 0.47
RAB9A P51151 1/20 0.47
NOX1 Q9Y5S8 1/20 0.47
PSMD14 O00487 1/20 0.47
CYP3A4 P08684 1/20 0.47
MAPK1 P28482 1/20 0.47
RECQL P46063 1/20 0.47
GFER P55789 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALDH3A1 P30838 1/20 0.44
ALDH1A3 P47895 1/20 0.44
KDM4E B2RXH2 1/20 0.43
GLA P06280 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12000833 0.92 ALDH1A1 (0.54) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL4434581 0.92 ALDH1A1 (0.54) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL14307311 0.90 CYP2C19 (0.46) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL20306689 0.89 CNR2 (0.45) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL14308404 0.88 CNR2 (0.50) CNR2CNR1ALDH1A1TSHRPSMD14
SCHEMBL27776204 0.86 CNR2 (0.53) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL109699 0.86 CNR2 (0.53) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL4428266 0.85 TSHR (0.70) CNR2CNR1ALDH1A1TSHRKMT2A
SCHEMBL4314634 0.84 CNR2 (0.52) CNR2CNR1ALDH1A1TSHRMEN1
SCHEMBL14283583 0.84 CNR2 (0.52) CNR2CNR1ALDH1A1TSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1765592-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Agfa Graphics N.V. (BE) 2007-03-28 EP disclosed
WO-2006005688-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. AGFA-GEVAERT (BE) 2006-01-19 WO disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0576622-B1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1997-11-05 EP disclosed
EP-0643333-A1 Donor element for use in a dry color proofing process EASTMAN KODAK COMPANY (US) 1995-03-15 EP disclosed
US-5374497-A Support, photosensitive imaging layer, print-out layer; multicolor EASTMAN KODAK COMPANY (US) 1994-12-20 US disclosed
EP-0576622-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1994-01-05 EP disclosed
WO-1992017821-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1992-10-15 WO disclosed
US-5141839-A LITHOGRAPHIC PRINTING PLATES HAVING A RADIATION-SENSITIVE LAYER COMPRISING A PHOTOCROSSLINKABLE POLYMER, A LEUCO DYE, A PHOTOOXIDANT AND A HETEROAROMATIC AMINE N-OXIDE EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
US-5141842-A Negative working lithography printing plates EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
US-4425424-A LEUCO DYE AND N-SULFONYLOXY PHOTOOXIDANT EASTMAN KODAK COMPANY (US) 1984-01-10 US disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed