SCHEMBL3894205

SCHEMBL3894205

CCO[SiH](CCCOCC(COC)OC)OCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKD3 O94806 2/20 0.41
PRKCG P05129 2/20 0.41
PRKCB P05771 2/20 0.41
PRKCA P17252 2/20 0.41
PRKCH P24723 2/20 0.41
PRKCI P41743 2/20 0.41
PRKCE Q02156 2/20 0.41
PRKCQ Q04759 2/20 0.41
PRKCZ Q05513 2/20 0.41
PRKCD Q05655 2/20 0.41
PRKD1 Q15139 2/20 0.41
LPAR1 Q92633 6/20 0.41
LPAR3 Q9UBY5 6/20 0.41
LPAR2 Q9HBW0 4/20 0.41
LPAR6 P43657 3/20 0.41
LPAR4 Q99677 3/20 0.41
LPAR5 Q9H1C0 3/20 0.41
AKT1 P31749 5/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3892470 0.88 PRKD3 (0.44) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL3896623 0.81 TDP1 (0.31)
SCHEMBL14007343 0.77 PRKD3 (0.56) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL4547618 0.77 PRKD3 (0.56) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL3893538 0.76 LPAR1 (0.39) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL14843018 0.75 PRKD3 (0.65) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL3891213 0.75
SCHEMBL3903654 0.75 ALDH1A1 (0.36) ALDH1A1
SCHEMBL14842644 0.74 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL7032675 0.74 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed