SCHEMBL3897372

SCHEMBL3897372

CCCCCCC(c1ccc(N(C)C)cc1)c1ccc(N(C)C)cc1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.44
GAA P10253 3/20 0.44
KDM4A O75164 3/20 0.44
KDM2A Q9Y2K7 3/20 0.44
HTR2A P28223 2/20 0.43
HRH1 P35367 1/20 0.43
HDAC11 Q96DB2 1/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
ALDH1A1 P00352 3/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
HSD17B10 Q99714 2/20 0.41
ALOX15 P16050 1/20 0.41
TSHR P16473 1/20 0.41
LMNA P02545 1/20 0.39
CYP3A4 P08684 1/20 0.39
GPBAR1 Q8TDU6 1/20 0.38
SLC2A1 P11166 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8179264 0.92 GAA (0.46) SIGMAR1GAAKDM4AKDM2AHTR2A
SCHEMBL17811537 0.89 SIGMAR1 (0.46) SIGMAR1GAAKDM4AKDM2AHTR2A
SCHEMBL10405490 0.84 ALDH1A1 (0.48) GAAHTR2AHRH1MEN1KMT2A
SCHEMBL21730035 0.84 GAA (0.43) GAAKDM4AKDM2AHDAC11MEN1
SCHEMBL10776429 0.84 CNR2 (0.52) SIGMAR1ALDH1A1L3MBTL1TSHRCYP3A4
SCHEMBL10631766 0.82 SIGMAR1 (0.42) SIGMAR1HTR2AHRH1MEN1KMT2A
SCHEMBL27702362 0.81 SIGMAR1 (0.53) SIGMAR1HTR2AHRH1MEN1KMT2A
SCHEMBL12672812 0.81 GAA (0.41) GAAKDM4AKDM2AHDAC11MEN1
SCHEMBL28099197 0.80 SIGMAR1 (0.43) SIGMAR1HTR2AHRH1MEN1KMT2A
SCHEMBL11702818 0.79 CYP19A1 (0.46) SIGMAR1HTR2AHRH1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed