SCHEMBL3899896

SCHEMBL3899896

C=C(OC(=C)Oc1cccc2ccccc12)Oc1cccc2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.54
MEN1 O00255 2/20 0.54
RAB9A P51151 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
HSD17B10 Q99714 3/20 0.51
ALDH1A1 P00352 3/20 0.51
GAA P10253 2/20 0.51
PGR P06401 1/20 0.51
PTGS1 P23219 1/20 0.51
MAPK1 P28482 1/20 0.51
KDM4E B2RXH2 3/20 0.44
HPGD P15428 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
MMP2 P08253 1/20 0.44
FABP7 O15540 3/20 0.43
FABP3 P05413 3/20 0.43
FABP5 Q01469 3/20 0.43
HTR1B P28222 2/20 0.43
BCHE P06276 1/20 0.43
SLC6A3 Q01959 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20179439 0.80 HSD17B10 (0.51) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL15759427 0.80 ALDH1A1 (0.56) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL7171655 0.79 KMT2A (0.58) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL29573442 0.79 KMT2A (0.58) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL6160141 0.79 HSD17B10 (0.55) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL7181428 0.79 ALDH1A1 (0.65) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL6884394 0.79 ALDH1A1 (0.55) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL4830581 0.78 ALDH1A1 (0.50) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL11316962 0.76 ALDH1A1 (0.55) KMT2AMEN1RAB9AL3MBTL1HSD17B10
SCHEMBL10371690 0.76 KMT2A (0.54) KMT2AMEN1RAB9AL3MBTL1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7524604-B2 Positive resist composition and method of formation of resist patterns TOKYO OHKA KOGYO CO., LTD (JP) 2009-04-28 US disclosed
US-20060247346-A1 Positive resist composition and method of formation of resist patterns TOKYO OHKA KOGYO CO., LTD. (JP) 2006-11-02 US disclosed
EP-1619553-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMATION OF RESIST PATTERNS TOKYO OHKA KOGYO CO., LTD. (JP) 2006-01-25 EP disclosed